Hansheng Zhao

Hansheng Zhao

*This is an algorithmically generated author record based on publicly available information.

Current Organizations / Institutes

The organizations/institutes from the scholar's latest article


Hansheng Zhao has a total of 8 co-authors. Here are the top co-authors by number of shared publications:

  • Mao Zhang

    State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, 1037 Luoyu Road, Wuhan 430074, China

    1 shared publication
  • Ming Ma

    School of Mechanical Engineering, Wuhan Polytechnic University, Wuhan 430023, China

    1 shared publication
  • Pan Gong

    State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, China

    1 shared publication
  • Shuobin Chen

    School of Mechanical Engineering, Wuhan Polytechnic University, Wuhan 430023, China

    1 shared publication
  • Ying Wang

    School of Mechanical Engineering, Wuhan Polytechnic University, Wuhan 430023, China

    1 shared publication
  • Yuhua Peng

    College of Artificial Intelligence, Wuchang University of Technology, Wuhan 430223, China

    1 shared publication

Latest Publications

  • Open Access

    Effects of Cu Content on the Corrosion Resistance of CuxCoCrMoNi High-Entropy Alloy

    by Yuhua Peng, Ying Wang, Hansheng Zhao, Shuobin Chen, Yuxuan Liu, Mao Zhang, Pan Gong, Zhigang Hu, Ming Ma

    In this study, the corrosion behavior of CuXCoCrMoNi (x = 0.3, 0.6, 0.9) high-entropy alloys (HEAs) in 3.5% NaCl solution is systematically investigated. The alloy samples show a strong link between copper content and corrosion resistance. It is noteworthy that an increase in copper content promotes element segregation, resulting in an increase in corrosion current density from 2.138 × 10−7 μA/cm2 to 1.8989 × 10−6 μA/cm2 and a decrease in charge transfer resistance from 182.6 Ω·cm2 to 42.34 Ω·cm2. In addition, electrochemical experiments demonstrate that lowering the copper content in the alloys reduces the spread and depth of corrosion. All alloys exhibit n-type semiconductor behavior, with donor density increasing from 4.792 × 1023 cm−3 to 5.581 × 1023 cm−3 with increasing copper content. Notably, the passive film is characterized by the presence of Cr2O3 and Cu2O as its main constituents. As the copper content in the HEA increases, higher levels of copper oxides in the passive film inhibit the formation of chromium oxides. This degrades the passive film quality, thereby diminishing the overall corrosion resistance.