The structure and composition of TiZrN, TiAlZrN and TiAlVN coatings
Authors:
- O. KnotekOKO. Knotek
- M. BöhmerMBM. Böhmer
- T. LeyendeckerTLT. Leyendecker
- F. JungblutFJF. Jungblut
- 1 December 1988
- journal article
- Published by Elsevier in Materials Science and Engineering: A
- Vol. 105-106, 481-488
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
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- Titanium aluminum nitride films: A new alternative to TiN coatingsJournal of Vacuum Science & Technology A, 1986
- On structure and properties of sputtered Ti and Al based hard compound filmsJournal of Vacuum Science & Technology A, 1986
- Structures and resistive properties of sputtered TiZrAlN thin filmsThin Solid Films, 1972
- Phase Relationships in the Binary Systems of Nitrides and Carbides of Zirconium, Columbium, Titanium, and VanadiumJournal of the Electrochemical Society, 1950