Surface OH group governing adsorption properties of metal oxide films
Authors:
- Satoshi TakedaSTSatoshi Takeda
- Makoto FukawaMFMakoto Fukawa
- Yasuo HayashiYHYasuo Hayashi
- Kiyoshi MatsumotoKMKiyoshi Matsumoto
- 1 February 1999
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 339 (1-2) , 220-224
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
- Chemical Analysis of Inorganic and Organic Surfaces and Thin Films by Static Time‐of‐Flight Secondary Ion Mass Spectrometry (TOF‐SIMS)Angewandte Chemie International Edition, 1994
- Machanical Durability of Water-Repellent Film on GlassJournal of the Ceramic Society of Japan, 1994
- Quantification of surface hydroxides using chemical labeling and XPSSurface and Interface Analysis, 1992
- An X‐ray photoelectron spectroscopic investigation of the selectivity of hydroxyl derivatization reactionsSurface and Interface Analysis, 1991
- XPS study of leached glass surfacesJournal of Non-Crystalline Solids, 1990
- X-Ray Photoelectron Spectroscopy of SiO 2 -Si Interfacial Regions: Ultrathin Oxide FilmsIBM Journal of Research and Development, 1978
- UV/Ozone Cleaning of SurfacesIEEE Transactions on Parts, Hybrids, and Packaging, 1976
- Water on silica and silicate surfaces. I. Partially hydrophobic silicasThe Journal of Physical Chemistry, 1973
- Measured binding energy shifts of "3p" and "3d" electrons in arsenic compoundsInorganic Chemistry, 1972
- Acidic and basic properties of hydroxylated metal oxide surfacesDiscussions of the Faraday Society, 1971