Electron Microscopy and X-ray Diffraction Study of AlN Layers
Authors:
Open Access
- 1 August 2002
- journal article
- Published by Institute of Physics, Polish Academy of Sciences in Acta Physica Polonica A
- Vol. 102 (2) , 221-225
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Morphological properties of AlN piezoelectric thin films deposited by DC reactive magnetron sputteringThin Solid Films, 2001
- Effect of substrate bias on AlN thin film preparation in shielded reactive vacuum arc depositionThin Solid Films, 2001
- Growth of columnar aluminum nitride layers on Si(111) by molecular beam epitaxyMaterials Science and Engineering: B, 1997
- Materials characterisation using heavy ion elastic recoil time of flight spectrometryNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1994
- Chemical stability of laminated AlN/AlN:H filmsThin Solid Films, 1994