Novel Nondestructive Methodology Using PV Measurement With NLS-Based Analysis and GIXRD for Comprehensive O/T/M Phase Analyses in Ferroelectric HZO
- 3 June 2025
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 72 (7) , 3582-3586
Abstract
This work demonstrates a novel nondestructive methodology combining a polarization-voltage (PV) measurement and grazing incidence X-ray diffraction (GIXRD) to comprehensively characterize the orthorhombic (O), tetragonal (T), and monoclinic (M) phases in ferroelectric (FE) HfZrO2 (HZO) films. The O/T phases are analyzed based on nucleation-limited switching (NLS) model with Weibull distribution to model antiferroelectric (AFE) polarization, while the M phase analysis employs a conventional GIXRD method. Results align with Monte Carlo simulations and Raman analysis, demonstrating consistency in phase percentages and PV characteristics. This approach offers an efficient and nondestructive methodology to analyze O/T/M phase percentages in FE materials and is very promising for FE technology.Keywords
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