Abstract
This work demonstrates a novel nondestructive methodology combining a polarization-voltage (PV) measurement and grazing incidence X-ray diffraction (GIXRD) to comprehensively characterize the orthorhombic (O), tetragonal (T), and monoclinic (M) phases in ferroelectric (FE) HfZrO2 (HZO) films. The O/T phases are analyzed based on nucleation-limited switching (NLS) model with Weibull distribution to model antiferroelectric (AFE) polarization, while the M phase analysis employs a conventional GIXRD method. Results align with Monte Carlo simulations and Raman analysis, demonstrating consistency in phase percentages and PV characteristics. This approach offers an efficient and nondestructive methodology to analyze O/T/M phase percentages in FE materials and is very promising for FE technology.

This publication has 21 references indexed in Scilit: