Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
Authors:
- T. BertaudTBT. Bertaud
- C. BermondCBC. Bermond
- T. LacrevazTLT. Lacrevaz
- C. ValléeCVC. Vallée
- Y. MorandYMY. Morand
- B. FléchetBFB. Fléchet
- A. FarcyAFA. Farcy
- M. Gros-JeanMGM. Gros-Jean
- S. BlonkowskiSBS. Blonkowski
- 1 March 2010
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 87 (3) , 301-305
Abstract
No abstract availableKeywords
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