Chemical Etching of Zinc Oxide for Thin‐Film Silicon Solar Cells
Open Access
- 8 December 2011
- journal article
- review article
- Published by Wiley in Chemphyschem
- Vol. 13 (1) , 66-73
Abstract
Chemical etching is widely applied to texture the surface of sputter‐deposited zinc oxide for light scattering in thin‐film silicon solar cells. Based on experimental findings from the literature and our own results we propose a model that explains the etching behavior of ZnO depending on the structural material properties and etching agent. All grain boundaries are prone to be etched to a certain threshold, that is defined by the deposition conditions and etching solution. Additionally, several approaches to modify the etching behavior through special preparation and etching steps are provided.Keywords
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