Nanostructure and hardness of titanium aluminum nitride prepared by plasma enhanced chemical vapor deposition
Authors:
- J. ShiehJSJ. Shieh
- M.H. HonMHM.H. Hon
- 1 July 2001
- journal article
- research article
- Published by Elsevier in Thin Solid Films
- Vol. 391 (1) , 101-108
Abstract
No abstract availableKeywords
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