Correction to “Hf/Zr Superlattice-Based High-κ Gate Dielectrics with Dipole Layer Engineering for Advanced CMOS”
Authors:
- Taeyoung SongTSTaeyoung Song
- Sanghyun KangSKSanghyun Kang
- Yu-Hsin KuoYKYu-Hsin Kuo
- Jiayi ChenJCJiayi Chen
- Lance FernandesLFLance Fernandes
- Nashrah AfrozeNANashrah Afroze
- Mengkun TianMTMengkun Tian
- Hyoung Won BaacHBHyoung Won Baac
- Changhwan ShinCSChanghwan Shin
- Asif Islam KhanAKAsif Islam Khan
Open Access
- 16 February 2026
- journal article
- Published by American Chemical Society (ACS) in ACS Nano
- Vol. 20 (8) , 7384
Abstract
No abstract availableFunding Information
- National Research Foundation of Korea (RS-2023-00260527)
- Semiconductor Research Corporation (3235.001)
- National Science Foundation (2047880)