A novel acrylic prepolymer/methacrylate modified nano-SiO2 composite used for negative photoresist
Authors:
- Yan YuanYYYan Yuan
- Ning ChenNCNing Chen
- Ren LiuRLRen Liu
- Shengwen ZhangSZShengwen Zhang
- Xiaoya LiuXLXiaoya Liu
- 1 February 2014
- journal article
- Published by Elsevier in Materials Research Bulletin
- Vol. 50, 392-398
Abstract
No abstract availableThis publication has 27 references indexed in Scilit:
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