Comprehensive effect of grain size and original target morphology on sputtering behavior of magnetron sputtering target

This publication has 30 references indexed in Scilit:

• Effect of grain size on magnetic properties and microstructure of Ni80Fe20 thin films
  Thin Solid Films, 2013
• Controllability Analysis of Reactive Magnetron Sputtering Process
  Acta Physica Polonica A, 2013
• Effect of temperature on the deposition of ZnO thin films by successive ionic layer adsorption and reaction
  Applied Surface Science, 2012
• Characterization of argon metastable species as function of time, space, and current of a pulsed dc glow discharge
  Spectrochimica Acta Part B: Atomic Spectroscopy, 2011
• Influence of deposition conditions on mechanical and tribological properties of nanostructured TiN/CNx multilayer films
  Surface and Coatings Technology, 2009
• Influence of surface morphology on corrosion and electronic behavior
  Acta Materialia, 2006
• Characterization of an Ar/N2 reactive amplified magnetron discharges by Atomic Absorption Spectroscopy and Glow Discharge Mass Spectrometry
  Surface and Coatings Technology, 2005
• Oxygen active species in an Ar–O2 magnetron discharge for titanium oxide deposition
  Applied Surface Science, 2003
• Drift in film thickness uniformity arising from sputtering target recrystallization
  Journal of Vacuum Science & Technology A, 1989
• The Relation Between Etch Rate and Optical Emission Intensity in Plasma Etching
  Journal of the Electrochemical Society, 1982