Reset First Resistive Switching in Ni1−xO Thin Films as Charge Transfer Insulator Deposited by Reactive RF Magnetron Sputtering

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Abstract
Reset-first resistive random access memory (RRAM) devices were demonstrated for off-stoichiometric Ni1−xO thin films deposited using reactive sputtering with a high oxygen partial pressure. The Ni1−xO based RRAM devices exhibited both unipolar and bipolar resistive switching characteristics without an electroforming step. Auger electron spectroscopy showed nickel deficiency in the Ni1−xO films, and X-ray photoemission spectroscopy showed that the Ni3+ valence state in the Ni1−xO films increased with increasing oxygen partial pressure. Conductive atomic force microscopy showed that the conductivity of the Ni1−xO films increased with increasing oxygen partial pressure during deposition, possibly contributing to the reset-first switching of the Ni1−xO films.
Funding Information
  • Ministry of Trade, Industry and Energy, Korea under the Industrial Strategic Technology Development Program (100680075)

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