Role of the Deposition Precursor Molecules in Defining Oxidation State of Deposited Copper in Surface Reduction Reactions on H-Terminated Si(111) Surface
- 18 November 2015
- journal article
- research article
- Published by American Chemical Society (ACS) in The Journal of Physical Chemistry C
- Vol. 119 (48) , 27018-27027
Abstract
No abstract availableKeywords
Funding Information
- Division of Chemistry (CHE-1057374)
- American Chemical Society Petroleum Research Fund
- National Institute of General Medical Sciences (P30-GM110758)
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