The effects of deposition and test conditions on nanomechanical behaviour of ultrathin films produced by plasma-enhanced chemical vapour deposition process at atmospheric pressure
Authors:
- Zygmunt RymuzaZRZygmunt Rymuza
- Maciej MisiakMMMaciej Misiak
- Zenobia Rzanek-BorochZRZenobia Rzanek-Boroch
- Krzysztof Schmidt-SzałowskiKSKrzysztof Schmidt-Szałowski
- Jadwiga JanowskaJJJadwiga Janowska
- 1 November 2004
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 466 (1-2) , 158-166
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
- Friction and wear properties in MEMSSensors and Actuators A: Physical, 2002
- Nano- to microscale wear and mechanical characterization using scanning probe microscopyWear, 2001
- Dichlorodimethylsilane as an anti-stiction monolayer for MEMS: a comparison to the octadecyltrichlorosilane self-assembled monolayerJournal of Microelectromechanical Systems, 2001
- Thin Films Deposition from Hexamethyldisiloxane and Hexamethyldisilazane under Dielectric-Barrier Discharge (DBD) ConditionsPlasmas and Polymers, 2000
- Deposition of SiO films from O2/HMDSO plasmasSurface and Coatings Technology, 1999
- Control tribological and mechanical properties of MEMS surfaces. Part 1: critical reviewMicrosystem Technologies, 1999
- Micro/nanotribological studies of polysilicon and SiC films for MEMS applicationsWear, 1998
- Critical Review: Adhesion in surface micromechanical structuresJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1997
- Surface engineering and microtribology for microelectromechanical systemsWear, 1996
- Appearance of stable glow discharge in air, argon, oxygen and nitrogen at atmospheric pressure using a 50 Hz sourceJournal of Physics D: Applied Physics, 1993