SiO x /SiN y multilayers for photovoltaic and photonic applications
Open Access
- 14 February 2012
- journal article
- Published by Springer Nature in Discover Nano
- Vol. 7 (1) , 124
Abstract
Microstructural, electrical, and optical properties of undoped and Nd3+-doped SiOx/SiNy multilayers fabricated by reactive radio frequency magnetron co-sputtering have been investigated with regard to thermal treatment. This letter demonstrates the advantages of using SiNy as the alternating sublayer instead of SiO2. A high density of silicon nanoclusters of the order 1019 nc/cm3 is achieved in the SiOx sublayers. Enhanced conductivity, emission, and absorption are attained at low thermal budget, which are promising for photovoltaic applications. Furthermore, the enhancement of Nd3+ emission in these multilayers in comparison with the SiOx/SiO2 counterparts offers promising future photonic applications.Keywords
This publication has 22 references indexed in Scilit:
- Progress in Piezotronics and Piezo‐PhototronicsAdvanced Materials, 2012
- New Si-based multilayers for solar cell applicationsDiscover Nano, 2011
- Formation and photoluminescence of Si quantum dots in SiO2/Si3N4 hybrid matrix for all-Si tandem solar cellsSolar Energy Materials and Solar Cells, 2010
- Effect of annealing and Nd concentration on the photoluminescence of Nd3+ ions coupled with silicon nanoparticlesJournal of Applied Physics, 2010
- Silicon quantum dot based solar cells: addressing the issues of doping, voltage and current transportProgress in Photovoltaics: Research and Applications, 2010
- Si nanoparticles in SiO2An atomic scale observation for optimization of optical devicesEurophysics Letters, 2009
- The structural and optical properties of SiO2/Si rich SiNxmultilayers containing Si-ncsNanotechnology, 2009
- Effects of Si nanocluster size and carrier–Er interaction distance on the efficiency of energy transferJournal of Luminescence, 2007
- Light emission efficiency and dynamics in silicon-rich silicon nitride filmsApplied Physics Letters, 2006
- An original approach for the fabrication of Si/SiO2 multilayers using reactive magnetron sputteringThin Solid Films, 2002