SiO2 shallow nanostructures ICP etching using ZEP electroresist
Authors:
- Marc GuilmainMGMarc Guilmain
- Abdelatif JaouadAJAbdelatif Jaouad
- Serge EcoffeySESerge Ecoffey
- Dominique DrouinDDDominique Drouin
- 1 August 2011
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 88 (8) , 2505-2508
Abstract
No abstract availableKeywords
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