Characterization of boron-doped micro- and nanocrystalline diamond films deposited by wafer-scale hot filament chemical vapor deposition for MEMS applications
Authors:
- Jingchun ZhangJZJingchun Zhang
- Jerry W. ZimmerJZJerry W. Zimmer
- Roger T. HoweRHRoger T. Howe
- Roya MaboudianRMRoya Maboudian
- 1 January 2008
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 17 (1) , 23-28
Abstract
No abstract availableThis publication has 22 references indexed in Scilit:
- The application of polycrystalline diamond in a thin film packaging process for MEMS resonatorsDiamond and Related Materials, 2006
- N‐type doped nano‐diamond in a first MEMS applicationPhysica Status Solidi (a), 2006
- Elasticity, strength, and toughness of single crystal silicon carbide, ultrananocrystalline diamond, and hydrogen-free tetrahedral amorphous carbonApplied Physics Letters, 2006
- Polycrystalline diamond MEMS resonator technology for sensor applicationsDiamond and Related Materials, 2006
- Technology of polycrystalline diamond thin films for microsystems applicationsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2005
- Mechanical characterization and stress engineering of nanocrystalline diamonds films for MEMS applicationsDiamond and Related Materials, 2005
- Materials science and fabrication processes for a new MEMS technology based on ultrananocrystalline diamond thin filmsJournal of Physics: Condensed Matter, 2004
- Structural and optical properties of diamond and nano-diamond films grown by microwave plasma chemical vapor depositionDiamond and Related Materials, 2001
- Diamond thin films: a 21st-century materialPhilosophical Transactions of the Royal Society A: Mathematical, Physical and Engineering Sciences, 2000
- Diamond MEMS — a new emerging technologyDiamond and Related Materials, 1999