Properties of aluminum oxide thin films deposited by pulsed laser deposition and plasma enhanced chemical vapor deposition
Authors:
- C. CibertCCC. Cibert
- H. HidalgoHHH. Hidalgo
- C. ChampeauxCCC. Champeaux
- P. TristantPTP. Tristant
- C. TixierCTC. Tixier
- J. DesmaisonJDJ. Desmaison
- A. CatherinotACA. Catherinot
- 1 January 2008
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 516 (6) , 1290-1296
Abstract
No abstract availableKeywords
This publication has 31 references indexed in Scilit:
- Chemical vapour deposition of coatingsProgress in Materials Science, 2003
- Influence of high-energy Si+ ion irradiation on microstructure and mechanical properties of alumina filmsSurface and Coatings Technology, 2002
- Surface oxidation of a Nb(100) single crystal by scanning tunneling microscopyMaterials Characterization, 2002
- The mechanical properties of alumina films formed by plasma deposition and by ion irradiation of sapphireNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2000
- Fluorescence of Cr3+ doped alumina optical waveguides prepared by pulsed laser deposition and sol–gel methodJournal of Luminescence, 2000
- Preparation and characterization of aluminum oxide films by plasma enhanced chemical vapor depositionSurface and Coatings Technology, 1997
- A micro-abrasive wear test, with particular application to coated systemsSurface and Coatings Technology, 1996
- Secondary neutral mass spectrometry (SNMS)-recent methodical progress and applications to fundamental studies in particle/surface interactionInternational Journal of Mass Spectrometry and Ion Processes, 1995
- An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experimentsJournal of Materials Research, 1992
- The tension of metallic films deposited by electrolysisProceedings of the Royal Society of London. Series A, Containing Papers of a Mathematical and Physical Character, 1909