Properties of aluminum oxide thin films deposited by pulsed laser deposition and plasma enhanced chemical vapor deposition

Authors:
  • CCC. Cibert
    C. Cibert
  • CCC. Champeaux
    C. Champeaux
  • PTP. Tristant
    P. Tristant
  • CTC. Tixier
    C. Tixier
  • JDJ. Desmaison
    J. Desmaison
  • ACA. Catherinot
    A. Catherinot

Abstract
No abstract available

This publication has 31 references indexed in Scilit: