Development of metal etch mask by single layer lift-off for silicon nitride photonic crystals
Authors:
- Kang-Mook LimKLKang-Mook Lim
- Shilpi GuptaSGShilpi Gupta
- Chad RoppCRChad Ropp
- Edo WaksEWEdo Waks
- 1 June 2011
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 88 (6) , 994-998
Abstract
No abstract availableKeywords
This publication has 21 references indexed in Scilit:
- Emission properties of high-Q silicon nitride photonic crystal heterostructure cavitiesApplied Physics Letters, 2008
- Modification of visible spontaneous emission with silicon nitride photonic crystal nanocavitiesOptics Express, 2007
- Silicon-based photonic crystal nanocavity light emittersApplied Physics Letters, 2006
- Spectrally enhanced light emission from aperiodic photonic structuresApplied Physics Letters, 2005
- Comparison Among Various$hbox Si_3hboxN _4$Waveguide Geometries Grown Within a CMOS Fabrication Pilot LineJournal of Lightwave Technology, 2004
- Spectral and spatial narrowing of the emission of silicon nanocrystals in a microcavityJournal of Applied Physics, 2004
- Silicon nanocrystals and Er3+ ions in an optical microcavityJournal of Applied Physics, 2001
- Two-dimensional photonic-bandgap structures operating at near-infrared wavelengthsNature, 1996
- Strong localization of photons in certain disordered dielectric superlatticesPhysical Review Letters, 1987
- Silicon nitride films on silicon for optical waveguidesApplied Optics, 1977