Total Ionizing Dose Effects in NOR and NAND Flash Memories

Authors:
  • AVAngelo Visconti
    Angelo Visconti
  • MBMauro Bonanomi
    Mauro Bonanomi
  • SBS. Beltrami
    S. Beltrami
  • JSJim R. Schwank
    Jim R. Schwank
  • MSMarty R. Shaneyfelt
    Marty R. Shaneyfelt
  • PPPhilippe Paillet
    Philippe Paillet

Abstract
We irradiated floating gate (FG) memories with nor and nand architecture by using different TID sources, including 2 MeV, 98 MeV, and 105 MeV protons, X-rays, and Upsi-rays. Two classes of phenomena are responsible for charge loss from programmed FGs: the first is charge generation, recombination, and transport in the dielectrics, while the second is the emission of electrons above the oxide band. Charge loss from programmed FGs irradiated with protons of different energy closely tracks results from Upsi-rays, whereas the use of X-rays results in dose enhancement effects.

This publication has 19 references indexed in Scilit: