Atomic-Layer-Deposited Aluminum Oxide (Al 2 O 3 ) as a Barrier for Local Oxidation of Silicon
Authors:
- 24 November 2025
- journal article
- Published by American Chemical Society (ACS) in ACS Applied Electronic Materials
- Vol. 7 (23) , 10747-10752
Abstract
No abstract availableThis publication has 35 references indexed in Scilit:
- Atomic layer deposited Al2O3 coatings on SUS 310S stainless steelSurface and Coatings Technology, 2025
- Reformulation of oxide growth equations for oxidation of silicon bond coat in environmental barrier coating systemsJournal of the European Ceramic Society, 2019
- Investigation of the initial deposition steps and the interfacial layer of Atomic Layer Deposited (ALD) Al2O3 on SiApplied Surface Science, 2019
- Chemically Stable Atomic-Layer-Deposited Al2O3 Films for ProcessabilityACS Omega, 2017
- Corrosion protection of steel with multilayer coatings: Improving the sealing properties of physical vapor deposition CrN coatings with Al 2 O 3 /TiO 2 atomic layer deposition nanolaminatesThin Solid Films, 2017
- A brief review of atomic layer deposition: from fundamentals to applicationsMaterials Today, 2014
- Encapsulation of organic solar cells with ultrathin barrier layers deposited by ozone-based atomic layer depositionOrganic Electronics, 2010
- The etching properties of Al2O3 thin films in N2/Cl2/BCl3 and Ar/Cl2/BCl3 gas chemistryMaterials Science and Engineering: B, 2005
- Low-Temperature Al2O3 Atomic Layer DepositionChemistry of Materials, 2004
- Characterization of the oxidation rate of densified SiN thin films by Auger and infrared absorption spectroscopiesThin Solid Films, 1997