On the origin of dynamic Ron in commercial GaN-on-Si HEMTs
- 1 February 2018
- journal article
- research article
- Published by Elsevier in Microelectronics Reliability
- Vol. 81, 306-311
Abstract
No abstract availableKeywords
Funding Information
- UPE (L007010)
- PowerGaN EPSRC (K014471)
This publication has 7 references indexed in Scilit:
- “Leaky Dielectric” Model for the Suppression of Dynamic $R_{\mathrm{ON}}$ in Carbon-Doped AlGaN/GaN HEMTsIEEE Transactions on Electron Devices, 2017
- GaN-on-Si Power Technology: Devices and ApplicationsIEEE Transactions on Electron Devices, 2017
- Electric Field Reduction in C-Doped AlGaN/GaN on Si High Electron Mobility TransistorsIEEE Electron Device Letters, 2015
- Intentionally Carbon-Doped AlGaN/GaN HEMTs: Necessity for Vertical Leakage PathsIEEE Electron Device Letters, 2014
- Deep-Level Characterization in GaN HEMTs-Part I: Advantages and Limitations of Drain Current Transient MeasurementsIEEE Transactions on Electron Devices, 2013
- GaN on Si Technologies for Power Switching DevicesIEEE Transactions on Electron Devices, 2013
- GaN as Seen by the IndustryPhysica Status Solidi (a), 1999