Surface sealing using self-assembled monolayers and its effect on metal diffusion in porous low- k dielectrics studied using monoenergetic positron beams
Authors:
- Akira UedonoAUAkira Uedono
- Silvia ArminiSASilvia Armini
- Yu ZhangYZYu Zhang
- Takeaki KakizakiTKTakeaki Kakizaki
- Reinhard Krause-RehbergRKReinhard Krause-Rehberg
- Wolfgang AnwandWAWolfgang Anwand
- Andreas WagnerAWAndreas Wagner
- 1 April 2016
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 368, 272-276
Abstract
No abstract availableKeywords
This publication has 22 references indexed in Scilit:
- Pore sealing of k 2.0 dielectrics assisted by self-assembled monolayers deposited from vapor phaseMicroelectronic Engineering, 2014
- Synergistic damage effects of vacuum ultraviolet photons and O2 in SiCOH ultra-low-k dielectric filmsJournal of Physics D: Applied Physics, 2010
- Characterization of Low-k/Cu Damascene Structures Using Monoenergetic Positron BeamsJapanese Journal of Applied Physics, 2009
- Low Dielectric Constant MaterialsChemical Reviews, 2009
- Porous low dielectric constant materials for microelectronicsPhilosophical Transactions of the Royal Society A: Mathematical, Physical and Engineering Sciences, 2005
- Determination of Pore Size in Mesoporous Thin Films from the Annihilation Lifetime of PositroniumThe Journal of Physical Chemistry B, 2001
- Positronium annihilation in mesoporous thin filmsPhysical Review B, 1999
- Positron annihilation in SiO2/Si structure at low temperatureJournal of Applied Physics, 1995
- Defects in electron irradiated vitreous SiO2probed by positron annihilationJournal of Physics: Condensed Matter, 1994
- Program system for analysing positron lifetime spectra and angular correlation curvesComputer Physics Communications, 1981