High speed pipe inner coating using magnetron hollow-cathode discharge in a magnetic field
Authors:
- 7 July 1991
- journal article
- Published by Elsevier in Materials Science and Engineering: A
- Vol. 140, 682-686
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Profile control of SiH radicals by cross magnetic field in plasma processingApplied Physics Letters, 1987
- Investigation of the growth kinetics of glow-discharge hydrogenated amorphous silicon using a radical separation techniqueJournal of Applied Physics, 1986
- Low Temperature Chemical Vapor Deposition Method Utilizing an Electron Cyclotron Resonance PlasmaJapanese Journal of Applied Physics, 1983
- The plasma-assisted chemical vapour deposition of TiC, TiN and TiCxN1−xThin Solid Films, 1981
- Reactive plasma deposited SixCyHz filmsThin Solid Films, 1979
- Low Pressure Sputtering System of the Magnetron TypeReview of Scientific Instruments, 1969