Optimization of sputtered ITO films with respect to the oxygen partial pressure and substrate temperature
Authors:
- K. CarlKCK. Carl
- H. SchmittHSH. Schmitt
- I. FriedrichIFI. Friedrich
- 1 February 1997
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 295 (1-2) , 151-155
Abstract
No abstract availableKeywords
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