Deposition of tin-doped indium oxide films by a modified reactive magnetron sputtering process
Authors:
- A.A. KarimAKA.A. Karim
- C. DeshpandeyCDC. Deshpandey
- H.J. DoerrHDH.J. Doerr
- R.F. BunshahRBR.F. Bunshah
- 1 May 1989
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 172 (1) , 111-121
Abstract
No abstract availableThis publication has 15 references indexed in Scilit:
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