Interface stability and microstructure of an ultrathin α-Ta/graded Ta(N)/TaN multilayer diffusion barrier
Authors:
- 1 October 2012
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 98, 80-84
Abstract
No abstract availableKeywords
Funding Information
- National Basic Research Program of China (2010CB631002)
- National Natural Science Foundation of China (51171124, 50871083)
- Scientific and Technical Supporting Programs of SCST (2008FZ0002)
- Program for New Century Excellent Talents in University (NCET-08-0380)
- State Key Laboratory for Mechanical Behavior of Materials (201011006)
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