Formation of Si nanodot arrays on the oxidized Si(1 0 0) surface

This publication has 12 references indexed in Scilit:

• Exclusion zone surrounding silicon nanoclusters formed by rapid thermal chemical vapour deposition on SiO2
  Surface Science, 2004
• Surface morphology of three-dimensional Si islands on Si(001) surfaces
  Surface Science, 2003
• Influence of the Chemical Properties of the Substrate on Silicon Quantum Dot Nucleation
  Journal of the Electrochemical Society, 2003
• Observation of the nucleation kinetics of Si quantum dots on SiO2 by energy filtered transmission electron microscopy
  Applied Surface Science, 2003
• Interface Morphology of Thermal-Oxide/Si(001) Studied by Scanning Tunneling Microscopy
  Japanese Journal of Applied Physics, 2002
• Three-dimensional Si islands on Si(001) surfaces
  Physical Review B, 2001
• Capacitance–voltage study of single-crystalline Si dots on ultrathin buried SiO2 formed by nanometer-scale local oxidation
  Thin Solid Films, 2000
• Silicon quantum dot nucleation on Si3N4, SiO2 and SiOxNy substrates for nanoelectronic devices
  Journal of Crystal Growth, 2000
• Fast and long retention-time nano-crystal memory
  IEEE Transactions on Electron Devices, 1996
• Local Ordering and Lateral Growth of Initial Thermal Oxide of Si(001)
  Japanese Journal of Applied Physics, 1994