Laser plasmochemical synthesis of hard protective SiCN films
- 1 August 2015
- journal article
- Published by SAGE Publications in Surface Engineering
- Vol. 31 (8) , 628-633
Abstract
A new method of laser plasma deposition had been applied to synthesise the silicon carbonitride (SiCN) coatings on stainless steel substrates and cutting devices using hexamethyldisilazane Si2NH(CH3)6 as a precursor. The precursor vapours were activated by powerful optical pulsating discharge in a high velocity gas stream (Ar). Characterisation of the films has been carried out by complex methods. The deposited coatings are amorphous, uniform in thickness and decorate surfaces of different engineering materials quite well. The nanohardness of SiCN coatings was estimated as 15–24 GPa.Keywords
This publication has 13 references indexed in Scilit:
- Atomistic investigation of structural and mechanical properties of silicon carbon nitride with different SiC/Si3N4 ratiosMaterials Chemistry and Physics, 2013
- Structure and composition of silicon nitride and silicon carbon nitride coatings for joint replacementsSurface and Coatings Technology, 2013
- The influence of chemical groups on the mechanical properties of SiCNH coatings deposited on 7075 aluminum alloyThin Solid Films, 2013
- Mid-frequency PECVD of a-SiCN:H films and their structural, mechanical and electrical propertiesVacuum, 2013
- The structure, surface topography and mechanical properties of Si–C–N films fabricated by RF and DC magnetron sputteringApplied Surface Science, 2011
- Effect of the chemical structure of silyl derivatives of unsymmetrical dimethylhydrazine on the composition and structure of silicon carbonitride films: Theoretical and experimental studiesInorganic Materials, 2007
- Remote nitrogen microwave plasma chemical vapor deposition from a tetramethyldisilazane precursor. 1. Growth mechanism, structure, and surface morphology of silicon carbonitride filmsThin Solid Films, 2005
- Silicon carbonitride, a new hard material and its relation to the confusion about ‘harder than diamond’ C3N4Thin Solid Films, 1999
- Laser-induced chemical vapor deposition of nanostructured silicon carbonitride thin filmsJournal of Applied Physics, 1998
- Metal film deposition by gas-phase laser pyrolysis of nickel tetracarbonylJournal of Applied Physics, 1985