Study of Cu diffusion behavior in carbon rich SiCN:H films deposited from trimethylphenylsilane
Authors:
- E. ErmakovaEEE. Ermakova
- K. MogilnikovKMK. Mogilnikov
- Yu. RumyantsevYRYu. Rumyantsev
- V. KichayVKV. Kichay
- E. MaximovskiiEME. Maximovskii
- O. SemenovaOSO. Semenova
- M. KosinovaMKM. Kosinova
- 1 August 2015
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 588, 39-43
Abstract
No abstract availableFunding Information
- RFBR (13-03-01198-a)
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