A statistical parameter study of indium tin oxide thin films deposited by radio-frequency sputtering

This publication has 9 references indexed in Scilit:

• Round pinholes in indium-tin-oxide thin films on the glass substrates: a Taguchi method analysis and theoretical approach to their origins
  Vacuum, 2003
• Effect of substrate temperature on the bonded states of indium tin oxide thin films deposited by plasma enhanced chemical vapor deposition
  Thin Solid Films, 2003
• Amorphous ITO thin films prepared by DC sputtering for electrochromic applications
  Thin Solid Films, 2002
• Light-addressed sub-μm electrodes for extracellular recording and stimulation of excitable cells
  Microelectronic Engineering, 2001
• Electrical properties of a light-addressable microelectrode chip with high electrode density for extracellular stimulation and recording of excitable cells
  Biosensors and Bioelectronics, 2001
• Influence of the process parameters on structural and electrical properties of r.f. magnetron sputtering ITO films
  Thin Solid Films, 2001
• Properties of ITO thin films deposited by RF magnetron sputtering at elevated substrate temperature
  Materials Science and Engineering: B, 2000
• TFT-LCD technology
  Thin Solid Films, 1999
• Effects of oxygen partial pressure on the microstructure and electrical properties of indium tin oxide film prepared by d.c. magnetron sputtering
  Thin Solid Films, 1995