The influence of target surface morphology on the deposition flux during direct-current magnetron sputtering
Authors:
- F. BoydensFBF. Boydens
- W.P. LeroyWLW.P. Leroy
- R. PersoonsRPR. Persoons
- D. DeplaDDD. Depla
- 1 March 2013
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 531, 32-41
Abstract
No abstract availableKeywords
Funding Information
- Institute for the Promotion of Innovation by Science and Technology in Flanders (IWT-Vlaanderen)
This publication has 27 references indexed in Scilit:
- Angular distribution of atoms during the magnetron sputtering of polycrystalline targetsTechnical Physics, 2012
- Angular-resolved energy flux measurements of a dc- and HIPIMS-powered rotating cylindrical magnetron in reactive and non-reactive atmosphereJournal of Physics D: Applied Physics, 2011
- Experimental determination and simulation of the angular distribution of the metal flux during magnetron sputter depositionJournal of Physics D: Applied Physics, 2010
- Compositional effects on the growth of Mg(M)O filmsJournal of Applied Physics, 2010
- Influence of surface morphology on sputtering yieldsJournal of Physics D: Applied Physics, 2009
- The metal flux from a rotating cylindrical magnetron: a Monte Carlo simulationJournal of Physics D: Applied Physics, 2008
- Effect of resonance charge exchange between argon ions on the effective sputtering rate in a magnetron dischargeTechnical Physics, 2004
- Monte Carlo simulation of ions in a magnetron plasmaIEEE Transactions on Plasma Science, 1991
- The microstructure of sputter‐deposited coatingsJournal of Vacuum Science & Technology A, 1986
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969