Preparation of large uniform amorphous silicon films by VHF-PECVD using a ladder-shaped antenna
Authors:
- 1 May 2001
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 386 (2) , 133-136
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Production of Inductively Coupled RF Plasma Using a Ladder-Shaped AntennaJapanese Journal of Applied Physics, 1997
- A voltage uniformity study in large-area reactors for RF plasma depositionPlasma Sources Science and Technology, 1997
- Magnetically enhanced inductively coupled plasma CVD for a-Si:H fabricationVacuum, 1997
- Inductively coupled radio frequency plasma chemical vapor deposition using a ladder-shaped antennaReview of Scientific Instruments, 1996
- Sheath impedance effects in very high frequency plasma experimentsJournal of Vacuum Science & Technology A, 1996
- Power Feeding in Large Area PECVD of Amorphous SiliconMRS Proceedings, 1995
- Frequency effects in silane plasmas for plasma enhanced chemical vapor depositionJournal of Vacuum Science & Technology A, 1992
- Diagnostic Study of VHF Plasma and Deposition of Hydrogenated Amorphous Silicon FilmsJapanese Journal of Applied Physics, 1990
- Influence of plasma excitation frequency fora-Si:H thin film depositionPlasma Chemistry and Plasma Processing, 1987