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Stabilizing the ferroelectric phase in HfO2-based films sputtered from ceramic targets under ambient oxygen
Publication with shared reference
10.1039/d0nr07699f
Home
Publications
Stabilizing the ferroelectric phase in HfO2-based films sputtered from ceramic targets under ambient oxygen
Publication with shared reference
10.1039/d0nr07699f
Publications with shared reference:
Stabilizing the ferroelectric phase in HfO
2
-based films sputtered from ceramic targets under ambient oxygen
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