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  3. Atomic layer deposition of TiO2 and Al‐doped TiO2 films on Ir substrates for ultralow leakage currents
  4. Publication with shared reference
  5. 10.1002/pssr.201105250
  1. Home
  2. Publications
  3. Atomic layer deposition of TiO2 and Al‐doped TiO2 films on Ir substrates for ultralow leakage currents
  4. Publication with shared reference
  5. 10.1002/pssr.201105250

Publications with shared reference:

Atomic layer deposition of TiO2 and Al‐doped TiO2 films on Ir substrates for ultralow leakage currents

0 publications found

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