Andre Krtschil
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Research Subjects
Andre Krtschil has a total of 45 co-authors. Here are the top co-authors by number of shared publications:
H. Witte
10 shared publications- Alois Krost
Institute of Experimental Physics, Otto-von-Guericke-University Magdeburg, D-39016 Magdeburg, Germany
9 shared publications J. Christen
Institute of Experimental Physics, Otto-von-Guericke-University Magdeburg, D-39016 Magdeburg, Germany
8 shared publications- Armin Dadgar
Otto-von-Guericke-Universität Magdeburg, Institut für Physik 3 , Magdeburg
7 shared publications M. Lisker
Institute of Experimental Physics, Otto-von-Guericke-University Magdeburg, D-39016 Magdeburg, Germany
4 shared publicationsA. Diez
Otto-von-Guericke-University Magdeburg Institute of Experimental Physics P.O. Box 4120, 39016 Magdeburg, Germany
3 shared publications
Latest Publications
- 1 August 2008
- Published by American Scientific Publishers in Sensor Letters
- Vol. 6 (4) , 601-606
Interdigitated Electrodes and Their Possibility to Determine the Excitation Region in Neurons in Cultured Networks
This report concerns investigations of the activation process of nerve cells cultured on large planar interdigitated electrodes. Cultured neurons from embryonic rat cerebral cortex form electrophysiologically active networks after one week in vitro. The treatment with antagonists to ionotropic glutamate and GABAA receptors blocks synaptic neurotransmission without affecting intrinsic excitability of neurons. Standard stimulation parameters, which were previously determined to trigger a generalized network response in control networks, were ineffective for activation of networks under a synaptic activity blockade. Here we show that in these conditions a pulse sequence of ten biphasic pulses with amplitude of ±2.2 V is adequate for global network stimulation, without cell damage. In specially designed compartment cultures we analyzed further the stimulation process in control and synaptically blocked networks with cell bodies spatially separated from the electrodes. Our results suggest that the direct stimulation of few neurons trigger network-wide responses by the activation of synaptic connections. Further, the stimulation of axonal neuritic extensions is sufficient to active single neurons.
- 1 August 2008
- Published by American Scientific Publishers in Sensor Letters
- Vol. 6 (4) , 601-606
Interdigitated Electrodes and Their Possibility to Determine the Excitation Region in Neurons in Cultured Networks
This report concerns investigations of the activation process of nerve cells cultured on large planar interdigitated electrodes. Cultured neurons from embryonic rat cerebral cortex form electrophysiologically active networks after one week in vitro. The treatment with antagonists to ionotropic glutamate and GABAA receptors blocks synaptic neurotransmission without affecting intrinsic excitability of neurons. Standard stimulation parameters, which were previously determined to trigger a generalized network response in control networks, were ineffective for activation of networks under a synaptic activity blockade. Here we show that in these conditions a pulse sequence of ten biphasic pulses with amplitude of ±2.2 V is adequate for global network stimulation, without cell damage. In specially designed compartment cultures we analyzed further the stimulation process in control and synaptically blocked networks with cell bodies spatially separated from the electrodes. Our results suggest that the direct stimulation of few neurons trigger network-wide responses by the activation of synaptic connections. Further, the stimulation of axonal neuritic extensions is sufficient to active single neurons.
- 1 July 2007
- Published by Springer Nature in Journal of Materials Research
- Vol. 22 (7) , 1775-1778
Electrical characterization of defect states in local conductivity domains in ZnO:N,As layers
P- and n-type conductivity domains in dual-doped ZnO:As+N layers grown by metal organic vapor phase epitaxy on GaN–sapphire templates were electrically microcharacterized by scanning capacitance microscopy (SCM) and scanning surface potential microscopy (SSPM) techniques with respect to their defect states. The p-type domains were found to be dominated by two acceptors with thermal activation energies of about 80 and 270 meV, as observed by transient SCM scans at different temperatures. Optically excited SSPM scans revealed defect-to-band transitions at 400, 459, and 505 nm omnipresent in both domain types as well as a shallower transition at 377 nm exclusively in the p-type regions. According to the similar energy levels, the optical transitions at 377 and 400 nm are assigned to acceptor states, whereby the 80-meV acceptor is probably responsible for the conversion from n- to p-type regions in the domains.
- 1 July 2007
- Published by Springer Nature in Journal of Materials Research
- Vol. 22 (7) , 1775-1778
Electrical characterization of defect states in local conductivity domains in ZnO:N,As layers
P- and n-type conductivity domains in dual-doped ZnO:As+N layers grown by metal organic vapor phase epitaxy on GaN–sapphire templates were electrically microcharacterized by scanning capacitance microscopy (SCM) and scanning surface potential microscopy (SSPM) techniques with respect to their defect states. The p-type domains were found to be dominated by two acceptors with thermal activation energies of about 80 and 270 meV, as observed by transient SCM scans at different temperatures. Optically excited SSPM scans revealed defect-to-band transitions at 400, 459, and 505 nm omnipresent in both domain types as well as a shallower transition at 377 nm exclusively in the p-type regions. According to the similar energy levels, the optical transitions at 377 and 400 nm are assigned to acceptor states, whereby the 80-meV acceptor is probably responsible for the conversion from n- to p-type regions in the domains.
- 1 January 2006
- Published by Springer Nature in MRS Proceedings
- Vol. 957
Electrical Characterization of Defect States in Local Conductivity Domains in ZnO:N,As Layers
- 1 January 2006
- Published by Springer Nature in MRS Proceedings
- Vol. 957
Electrical Characterization of Defect States in Local Conductivity Domains in ZnO:N,As Layers
- 20 December 2005
- Published by AIP Publishing in Applied Physics Letters
- Vol. 87 (26) , 262105
Local p-type conductivity in zinc oxide dual-doped with nitrogen and arsenic
A doping approach for -type ZnO is reported which is reproducible and long-time stable. For -type doping the zinc oxide layers were doped simultaneously with nitrogen and arsenic in metal organic vapor phase epitaxy. The conductivity type of the layers was investigated by scanning capacitance microscopy, a technique based on local capacitance-voltage analysis with submicron spatial resolution. Depending on the growth parameters, largely extended -type domains were observed, surrounded by -type regions. The differences in local conductivity type are directly correlated to the topography as measured with atomic force microscopy revealing -type for smooth, two-dimensional surfaces and -type signals in the case of three-dimensional island growth or structural defects, i.e., microcracks or surface pits.- 20 December 2005
- Published by AIP Publishing in Applied Physics Letters
- Vol. 87 (26) , 262105
Local p-type conductivity in zinc oxide dual-doped with nitrogen and arsenic
A doping approach for -type ZnO is reported which is reproducible and long-time stable. For -type doping the zinc oxide layers were doped simultaneously with nitrogen and arsenic in metal organic vapor phase epitaxy. The conductivity type of the layers was investigated by scanning capacitance microscopy, a technique based on local capacitance-voltage analysis with submicron spatial resolution. Depending on the growth parameters, largely extended -type domains were observed, surrounded by -type regions. The differences in local conductivity type are directly correlated to the topography as measured with atomic force microscopy revealing -type for smooth, two-dimensional surfaces and -type signals in the case of three-dimensional island growth or structural defects, i.e., microcracks or surface pits.- 16 February 2005
- Published by Wiley in physica status solidi (c)
- Vol. 2 (3) , 1039-1046
Giant traps associated with extended defects in GaN and SiC
- 16 February 2005
- Published by Wiley in physica status solidi (c)
- Vol. 2 (3) , 1039-1046
Giant traps associated with extended defects in GaN and SiC
- 27 August 2004
- Published by AIP Publishing in Applied Physics Letters
- Vol. 85 (9) , 1496-1498
Ostwald ripening and flattening of epitaxial ZnO layers during in situ annealing in metalorganic vapor phase epitaxy
films were grown at by metalorganic vapor phase epitaxy on substrate and subsequently annealed in situ at for times ranging from to . The epitaxial layers were characterized by atomic force microscopy, x-ray diffraction, and cathodoluminescence measurements. The as-grown layers consist of three-dimensional nanoscale-sized clusters of [0001]-oriented monocrystallites. During the first of annealing, a surface smoothening due to a redistribution of material is observed leading to a decrease of both the island numbers and their heights. After of annealing, the surface morphology has completely changed and is transformed into a nearly two-dimensional cluster-free surface. This phase transition is accompanied by a strong improvement of the crystalline and optical properties. The effect is attributed to Ostwald ripening with a subsequent flattening of the crystal surface.- 27 August 2004
- Published by AIP Publishing in Applied Physics Letters
- Vol. 85 (9) , 1496-1498
Ostwald ripening and flattening of epitaxial ZnO layers during in situ annealing in metalorganic vapor phase epitaxy
films were grown at by metalorganic vapor phase epitaxy on substrate and subsequently annealed in situ at for times ranging from to . The epitaxial layers were characterized by atomic force microscopy, x-ray diffraction, and cathodoluminescence measurements. The as-grown layers consist of three-dimensional nanoscale-sized clusters of [0001]-oriented monocrystallites. During the first of annealing, a surface smoothening due to a redistribution of material is observed leading to a decrease of both the island numbers and their heights. After of annealing, the surface morphology has completely changed and is transformed into a nearly two-dimensional cluster-free surface. This phase transition is accompanied by a strong improvement of the crystalline and optical properties. The effect is attributed to Ostwald ripening with a subsequent flattening of the crystal surface.- 23 April 2004
- Published by AIP Publishing in Applied Physics Letters
- Vol. 84 (18) , 3498-3500
Suppressing of optical quenching of deep defect-to-band transitions in AlGaN and GaN/AlGaN heterostructures
Quenching of photocurrent spectroscopy and thermally stimulated currents has been investigated in undoped AlGaN layers and GaN/AlGaN heterostructures grown by metalorganic vapor phase epitaxy on sapphire substrates. The quenching was induced by an additional illumination as well as by an excitation with light below bandgap energy, respectively. In GaN layers, mainly the thermal defect emission band between 210 and 300 K is involved in the quenching processes and there are strong indications of a reduction of the band by incorporation of aluminum. In AlGaN layers, a decrease of quenching with increasing Al content is observed in accordance to a reduction of the height of the thermal emission between 210 and 300 K in these layers. These results are supported by quenching experiments in AlGaN/GaN heterostructures.
- 23 April 2004
- Published by AIP Publishing in Applied Physics Letters
- Vol. 84 (18) , 3498-3500
Suppressing of optical quenching of deep defect-to-band transitions in AlGaN and GaN/AlGaN heterostructures
Quenching of photocurrent spectroscopy and thermally stimulated currents has been investigated in undoped AlGaN layers and GaN/AlGaN heterostructures grown by metalorganic vapor phase epitaxy on sapphire substrates. The quenching was induced by an additional illumination as well as by an excitation with light below bandgap energy, respectively. In GaN layers, mainly the thermal defect emission band between 210 and 300 K is involved in the quenching processes and there are strong indications of a reduction of the band by incorporation of aluminum. In AlGaN layers, a decrease of quenching with increasing Al content is observed in accordance to a reduction of the height of the thermal emission between 210 and 300 K in these layers. These results are supported by quenching experiments in AlGaN/GaN heterostructures.
- 2 June 2003
- Published by AIP Publishing in Applied Physics Letters
- Vol. 82 (23) , 4083-4085
Deep-defect-induced quenching effects in semi-insulating GaN layers detected by photoelectrical spectroscopic techniques
Quenching effects induced by additional below-bandgap illumination in undoped semi-insulating GaN were investigated using optical admittance spectroscopy (OAS) and photocurrent (PC) spectroscopy as well as optically excited, thermally stimulated currents (TSC). In OAS and PC, a decrease of defect-related signals due to the quenching light was observed. The thermal quenching of the defect band between 2.7 and 3.3 eV shows a good agreement with thermal emissions as measured by TSC, indicating the same defects cause the optical transitions in OAS/PC and the thermal transitions in TSC. The thermal emission in the temperature region between 250 and 300 K, which is responsible for the thermal quenching of the blue band (BB) in OAS, also shows an optical quenching under below-bandgap excitation.
- 2 June 2003
- Published by AIP Publishing in Applied Physics Letters
- Vol. 82 (23) , 4083-4085
Deep-defect-induced quenching effects in semi-insulating GaN layers detected by photoelectrical spectroscopic techniques
Quenching effects induced by additional below-bandgap illumination in undoped semi-insulating GaN were investigated using optical admittance spectroscopy (OAS) and photocurrent (PC) spectroscopy as well as optically excited, thermally stimulated currents (TSC). In OAS and PC, a decrease of defect-related signals due to the quenching light was observed. The thermal quenching of the defect band between 2.7 and 3.3 eV shows a good agreement with thermal emissions as measured by TSC, indicating the same defects cause the optical transitions in OAS/PC and the thermal transitions in TSC. The thermal emission in the temperature region between 250 and 300 K, which is responsible for the thermal quenching of the blue band (BB) in OAS, also shows an optical quenching under below-bandgap excitation.
- 28 February 2003
- Published by Elsevier in Journal of Crystal Growth
- Vol. 248, 542-547
Electrical microcharacterization of dislocation-related charges in GaN-based single layers by scanning probe microscopy techniques
- 28 February 2003
- Published by Elsevier in Journal of Crystal Growth
- Vol. 248, 542-547
Electrical microcharacterization of dislocation-related charges in GaN-based single layers by scanning probe microscopy techniques
- 15 January 2003
- Published by AIP Publishing in Applied Physics Letters
- Vol. 82 (3) , 403-405
Electrical field effect of H-implantation induced defect states in GaN
Gallium nitride layers grown by metalorganic vapor phase epitaxy on sapphire substrates were implanted with 20 keV hydrogen ions with fluences between and ions per cm2. The resulting deep level spectrum was analyzed by deep level transient as well as by admittance spectroscopy. Beside several electron traps of probably intrinsic nature already known from other implantation experiments, a group of defects exclusively appeared after hydrogen implantation showing a strong electrical field effect in the corresponding emission characteristics. These peculiar states were characterized in detail and compared with defects showing a similar field effect already observed by other groups, suggesting the interpretation as hydrogen-decorated dislocations.- 15 January 2003
- Published by AIP Publishing in Applied Physics Letters
- Vol. 82 (3) , 403-405
Electrical field effect of H-implantation induced defect states in GaN
Gallium nitride layers grown by metalorganic vapor phase epitaxy on sapphire substrates were implanted with 20 keV hydrogen ions with fluences between and ions per cm2. The resulting deep level spectrum was analyzed by deep level transient as well as by admittance spectroscopy. Beside several electron traps of probably intrinsic nature already known from other implantation experiments, a group of defects exclusively appeared after hydrogen implantation showing a strong electrical field effect in the corresponding emission characteristics. These peculiar states were characterized in detail and compared with defects showing a similar field effect already observed by other groups, suggesting the interpretation as hydrogen-decorated dislocations.