Harun H. Solak
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Research Subjects
Harun H. Solak has a total of 30 co-authors. Here are the top co-authors by number of shared publications:
Christian David
Paul Scherrer Institut, CH-5232 Villigen-PSI, Switzerland
3 shared publicationsChristian Dais
2 shared publications- Yasin Ekinci
PSI Center for Photon Science, Paul Scherrer Institute, Villigen PSI, Switzerland
2 shared publications C. David
Laboratory for Micro- and Nanotechnology, Paul Scherrer Institut, 5232 Villigen PSI, Switzerland
1 shared publication- Detlev Grützmacher
Forschungszentrum Jülich
1 shared publication Elisabeth Müller
Laboratory for Micro- and Nanotechnology, Paul Scherrer Institut, 5232 Villigen, Switzerland
1 shared publication
Latest Publications
- 1 June 2017
- Published by Elsevier in Microelectronic Engineering
- Vol. 177, 9-12
High rotational symmetry photonic structures fabricated with multiple exposure Displacement Talbot Lithography
- 1 June 2017
- Published by Elsevier in Microelectronic Engineering
- Vol. 177, 9-12
High rotational symmetry photonic structures fabricated with multiple exposure Displacement Talbot Lithography
- 1 May 2010
- Published by Elsevier in Microelectronic Engineering
- Vol. 87 (5-8) , 854-858
Fabrication of Fresnel zone plates with 25nm zone width using extreme ultraviolet holography
- 1 May 2010
- Published by Elsevier in Microelectronic Engineering
- Vol. 87 (5-8) , 854-858
Fabrication of Fresnel zone plates with 25nm zone width using extreme ultraviolet holography
- 25 June 2009
- Published by Elsevier in Applied Surface Science
- Vol. 256 (2) , 431-434
Surface plasmon resonance in near-field coupled gold cylinder arrays fabricated by EUV-interference lithography and hot embossing
- 25 June 2009
- Published by Elsevier in Applied Surface Science
- Vol. 256 (2) , 431-434
Surface plasmon resonance in near-field coupled gold cylinder arrays fabricated by EUV-interference lithography and hot embossing
- 8 October 2007
- Published by SPIE-Intl Soc Optical Eng
- Vol. 6717
Engineering gold nano-antennae to enhance the emission of quantum emitters
We study the fluorescence enhancement of a single emitter coupled to two spherical gold nanoparticles and discuss the differences with respect to coupling to a single one. We also show that by changing the aspect ratio of the nanoparticles we can easily tune the plasmon-mediated enhancement from the infrared to the visible range. We present the fabrication of our nanoantennae by two alternative methods, namely X-ray interference lithography followed by focused ion beam milling and electron beam lithography. The manufactured structures are characterized individually by confocal microscopy.
- 8 October 2007
- Published by SPIE-Intl Soc Optical Eng
- Vol. 6717
Engineering gold nano-antennae to enhance the emission of quantum emitters
We study the fluorescence enhancement of a single emitter coupled to two spherical gold nanoparticles and discuss the differences with respect to coupling to a single one. We also show that by changing the aspect ratio of the nanoparticles we can easily tune the plasmon-mediated enhancement from the infrared to the visible range. We present the fabrication of our nanoantennae by two alternative methods, namely X-ray interference lithography followed by focused ion beam milling and electron beam lithography. The manufactured structures are characterized individually by confocal microscopy.
- 1 July 2007
- Published by Elsevier in Surface Science
- Vol. 601 (13) , 2787-2791
Ge quantum dot molecules and crystals: Preparation and properties
- 1 July 2007
- Published by Elsevier in Surface Science
- Vol. 601 (13) , 2787-2791
Ge quantum dot molecules and crystals: Preparation and properties
- 1 March 2005
- Published by Elsevier in Microelectronic Engineering
- Vol. 78-79, 410-416
Space-invariant multiple-beam achromatic EUV interference lithography
- 1 March 2005
- Published by Elsevier in Microelectronic Engineering
- Vol. 78-79, 410-416
Space-invariant multiple-beam achromatic EUV interference lithography
- 4 October 2004
- Published by AIP Publishing in Applied Physics Letters
- Vol. 85 (14) , 2700-2702
Fabrication of high-resolution zone plates with wideband extreme-ultraviolet holography
We report an achromatic holographic method to fabricate high-resolution x-ray optics using coherent extreme-ultraviolet radiation from an undulator source. The interference pattern between two spherical beams, which are created using Fresnel zone plates, is recorded to produce a higher-resolution zone plate. Analytical and simulation results showing the formation of the zone plate pattern was confirmed experimentally with the production and testing of a lens with outermost zone width. The combination of extreme-ultraviolet light, which exposes photoresists with practically no proximity effect, and holography, which guarantees the accurate placement of zones, addresses the main difficulties faced in the improvement of the resolution of x-ray lenses. Holography with extreme-ultraviolet light has the potential to produce lenses with sub- resolution.- 4 October 2004
- Published by AIP Publishing in Applied Physics Letters
- Vol. 85 (14) , 2700-2702
Fabrication of high-resolution zone plates with wideband extreme-ultraviolet holography
We report an achromatic holographic method to fabricate high-resolution x-ray optics using coherent extreme-ultraviolet radiation from an undulator source. The interference pattern between two spherical beams, which are created using Fresnel zone plates, is recorded to produce a higher-resolution zone plate. Analytical and simulation results showing the formation of the zone plate pattern was confirmed experimentally with the production and testing of a lens with outermost zone width. The combination of extreme-ultraviolet light, which exposes photoresists with practically no proximity effect, and holography, which guarantees the accurate placement of zones, addresses the main difficulties faced in the improvement of the resolution of x-ray lenses. Holography with extreme-ultraviolet light has the potential to produce lenses with sub- resolution.- 1 November 2003
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
- Vol. 21 (6) , 2883-2887
Patterning of circular structure arrays with interference lithography
- 1 November 2003
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
- Vol. 21 (6) , 2883-2887
Patterning of circular structure arrays with interference lithography
- 31 July 2002
- Published by Elsevier in Microelectronic Engineering
- Vol. 61-62, 77-82
Four-wave EUV interference lithography
- 31 July 2002
- Published by Elsevier in Microelectronic Engineering
- Vol. 61-62, 77-82
Four-wave EUV interference lithography