Wei Ma
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Previous Organizations / Institutes
The organizations / institutes from the scholar's other articles in the past ten years
Wei Ma has a total of 63 co-authors. Here are the top co-authors by number of shared publications:
- Wencai Ren
Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang, People’s Republic of China
7 shared publications - Hui-Ming Cheng
Institute of Technology for Carbon Neutrality, Shenzhen Institutes of Advanced Technology
6 shared publications - Dong-Ming Sun
Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang, China
4 shared publications Chuan Xu
Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, P. R. China
3 shared publicationsZhibo Liu
Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences
3 shared publications- Atsushi Takahara
Research Center for Negative Emission Technologies, Kyushu University, Fukuoka, Japan
2 shared publications
Latest Publications
- Open Access
- 29 April 2025
- Published by National Academy of Sciences in Proceedings of the National Academy of Sciences
- Vol. 122 (18)
Intelligent self-correcting growth of uniform Bernal-stacked bi-/trilayer graphene
State-of-the-art synthesis strategies of two-dimensional (2D) materials have been designed following the nucleation-dominant pattern for structure control. However, this classical methodology fails to achieve the precise layer- and stacking-resolved growth of wafer-scale few-layer 2D materials due to its intrinsically low energy resolution. Here, we present an intelligent self-correcting method for the high-resolution growth of uniform few-layer graphene. We demonstrate the layer-resolved growth of wafer-scale bilayer and trilayer graphene (BLG and TLG) with selective Bernal stacking through spontaneous correction of the single-layer graphene film with disordered multilayer graphene islands. Theoretical calculations reveal that the self-correcting growth is driven by the stepwise energy minimization of the closed system and kinetically activated by forming a low-barrier pathway for the carbon detachment-diffusion-attachment. Such uniform Bernal-stacked BLG and TLG films show high quality with distinct quantum Hall effect being observed. Our work opens an avenue for developing an intelligent methodology to realize the precise synthesis of diverse 2D materials.
- 29 April 2025
- Published by National Academy of Sciences in Proceedings of the National Academy of Sciences
- Vol. 122 (18)
Open AccessIntelligent self-correcting growth of uniform Bernal-stacked bi-/trilayer graphene
State-of-the-art synthesis strategies of two-dimensional (2D) materials have been designed following the nucleation-dominant pattern for structure control. However, this classical methodology fails to achieve the precise layer- and stacking-resolved growth of wafer-scale few-layer 2D materials due to its intrinsically low energy resolution. Here, we present an intelligent self-correcting method for the high-resolution growth of uniform few-layer graphene. We demonstrate the layer-resolved growth of wafer-scale bilayer and trilayer graphene (BLG and TLG) with selective Bernal stacking through spontaneous correction of the single-layer graphene film with disordered multilayer graphene islands. Theoretical calculations reveal that the self-correcting growth is driven by the stepwise energy minimization of the closed system and kinetically activated by forming a low-barrier pathway for the carbon detachment-diffusion-attachment. Such uniform Bernal-stacked BLG and TLG films show high quality with distinct quantum Hall effect being observed. Our work opens an avenue for developing an intelligent methodology to realize the precise synthesis of diverse 2D materials.
- 21 January 2025
- Published by Elsevier in Measurement
- Vol. 247, 116814
Prediction of residual stress and deflection in multi-process milling of large thin-walled components with initial bulk residual stress
- 21 January 2025
- Published by Elsevier in Measurement
- Vol. 247, 116814
Prediction of residual stress and deflection in multi-process milling of large thin-walled components with initial bulk residual stress
- Open Access
Challenges and opportunities in 2D high‐entropy alloy electrocatalysts for sustainable energy conversion
- Open Access
- 3 February 2022
- Published by Wiley in Angewandte Chemie International Edition
- Vol. 61 (13) , e202115389
Electrochemical Deposition of a Single‐Crystalline Nanorod Polycyclic Aromatic Hydrocarbon Film with Efficient Charge and Exciton Transport
Electrochemical deposition has emerged as an efficient technique for preparing conjugated polymer films on electrodes. However, this method encounters difficulties in synthesizing crystalline products and controlling their orientation on electrodes. Here we report electrochemical film deposition of a large polycyclic aromatic hydrocarbon. The film is composed of single‐crystalline nanorods, in which the molecules adopt a cofacial stacking arrangement along the π–π direction. Film thickness and crystal size can be controlled by electrochemical conditions such as scan rate and electrolyte species, while the choice of anode material determines crystal orientation. The film supports exceptionally efficient migration of both free carriers and excitons: the free carrier mobility reaches over 30 cm2 V−1 s−1, whereas the excitons are delocalized with a low binding energy of 118.5 meV and a remarkable exciton diffusion length of 45 nm.
- 3 February 2022
- Published by Wiley in Angewandte Chemie International Edition
- Vol. 61 (13) , e202115389
Open AccessElectrochemical Deposition of a Single‐Crystalline Nanorod Polycyclic Aromatic Hydrocarbon Film with Efficient Charge and Exciton Transport
Electrochemical deposition has emerged as an efficient technique for preparing conjugated polymer films on electrodes. However, this method encounters difficulties in synthesizing crystalline products and controlling their orientation on electrodes. Here we report electrochemical film deposition of a large polycyclic aromatic hydrocarbon. The film is composed of single‐crystalline nanorods, in which the molecules adopt a cofacial stacking arrangement along the π–π direction. Film thickness and crystal size can be controlled by electrochemical conditions such as scan rate and electrolyte species, while the choice of anode material determines crystal orientation. The film supports exceptionally efficient migration of both free carriers and excitons: the free carrier mobility reaches over 30 cm2 V−1 s−1, whereas the excitons are delocalized with a low binding energy of 118.5 meV and a remarkable exciton diffusion length of 45 nm.
- Open Access
- 20 December 2021
- Published by Wiley in Angewandte Chemie
- Vol. 134 (13)
Electrochemical Deposition of a Single‐Crystalline Nanorod Polycyclic Aromatic Hydrocarbon Film with Efficient Charge and Exciton Transport
Electrochemical deposition has emerged as an efficient technique for preparing conjugated polymer films on electrodes. However, this method encounters difficulties in synthesizing crystalline products and controlling their orientation on electrodes. Here we report electrochemical film deposition of a large polycyclic aromatic hydrocarbon. The film is composed of single‐crystalline nanorods, in which the molecules adopt a cofacial stacking arrangement along the π–π direction. Film thickness and crystal size can be controlled by electrochemical conditions such as scan rate and electrolyte species, while the choice of anode material determines crystal orientation. The film supports exceptionally efficient migration of both free carriers and excitons: the free carrier mobility reaches over 30 cm2 V−1 s−1, whereas the excitons are delocalized with a low binding energy of 118.5 meV and a remarkable exciton diffusion length of 45 nm.
- 20 December 2021
- Published by Wiley in Angewandte Chemie
- Vol. 134 (13)
Open AccessElectrochemical Deposition of a Single‐Crystalline Nanorod Polycyclic Aromatic Hydrocarbon Film with Efficient Charge and Exciton Transport
Electrochemical deposition has emerged as an efficient technique for preparing conjugated polymer films on electrodes. However, this method encounters difficulties in synthesizing crystalline products and controlling their orientation on electrodes. Here we report electrochemical film deposition of a large polycyclic aromatic hydrocarbon. The film is composed of single‐crystalline nanorods, in which the molecules adopt a cofacial stacking arrangement along the π–π direction. Film thickness and crystal size can be controlled by electrochemical conditions such as scan rate and electrolyte species, while the choice of anode material determines crystal orientation. The film supports exceptionally efficient migration of both free carriers and excitons: the free carrier mobility reaches over 30 cm2 V−1 s−1, whereas the excitons are delocalized with a low binding energy of 118.5 meV and a remarkable exciton diffusion length of 45 nm.
- Top Cited Papers
- 7 August 2020
- Published by American Association for the Advancement of Science (AAAS) in Science
- Vol. 369 (6504) , 670-674
Chemical vapor deposition of layered two-dimensional MoSi 2 N 4 materials
Stabilizing monolayer nitrides with silicon: Transition metal carbides and nitrides are nonlayered materials that in monolayer form have potentially useful electronic and chemical properties. These monolayers are usually made by chemical etching that produces flakes with surface defects that have poor air and water stability. Hong et al. report that introducing silicon during chemical vapor deposition growth of molybdenum nitride passivates the surface and prevents island formation. Centimeter-scale monolayer films of the semiconductor MoSi 2 N 4 form as a MoN 2 layer sandwiched by two Si-N bilayers. These layers possess high mechanical strength and ambient stability. Science , this issue p. 670
- 7 August 2020
- Published by American Association for the Advancement of Science (AAAS) in Science
- Vol. 369 (6504) , 670-674
Top Cited PapersChemical vapor deposition of layered two-dimensional MoSi 2 N 4 materials
Stabilizing monolayer nitrides with silicon: Transition metal carbides and nitrides are nonlayered materials that in monolayer form have potentially useful electronic and chemical properties. These monolayers are usually made by chemical etching that produces flakes with surface defects that have poor air and water stability. Hong et al. report that introducing silicon during chemical vapor deposition growth of molybdenum nitride passivates the surface and prevents island formation. Centimeter-scale monolayer films of the semiconductor MoSi 2 N 4 form as a MoN 2 layer sandwiched by two Si-N bilayers. These layers possess high mechanical strength and ambient stability. Science , this issue p. 670
- 10 February 2020
- Published by American Chemical Society (ACS) in Langmuir
- Vol. 36 (7) , 1718-1726
Structure and Properties of Hybrid Film Fabricated by Spin-Assisted Layer-by-Layer Assembly of Sacran and Imogolite Nanotubes
A free-standing (biomacomolecule/natural inorganic nanotube) hybrid film was fabricated through alternative layer-by-layer (LBL) assembly of sacran and imogolite nanotubes. Sacran is a natural polysaccharide extracted from the cyanobacterium Aphanothece sacrum, while imogolite is a natural tubular aluminosilicate clay found in volcano ash. The hybrid film thickness increased linearly with the number of the bilayers, because of the interaction between the negatively charged surface of sacran and the positively charged surface of imogolite. UV–vis spectroscopy indicated that the LBL film exhibited good transparency. The surface morphology of the LBL film was smooth in the micrometer scale; many imogolite nanotubes were adsorbed onto the sacran layer, while no imogolite clusters were observed. Furthermore, the structure, stability, gas permeability, and mechanical properties of the LBL films were investigated.
- 10 February 2020
- Published by American Chemical Society (ACS) in Langmuir
- Vol. 36 (7) , 1718-1726
Structure and Properties of Hybrid Film Fabricated by Spin-Assisted Layer-by-Layer Assembly of Sacran and Imogolite Nanotubes
A free-standing (biomacomolecule/natural inorganic nanotube) hybrid film was fabricated through alternative layer-by-layer (LBL) assembly of sacran and imogolite nanotubes. Sacran is a natural polysaccharide extracted from the cyanobacterium Aphanothece sacrum, while imogolite is a natural tubular aluminosilicate clay found in volcano ash. The hybrid film thickness increased linearly with the number of the bilayers, because of the interaction between the negatively charged surface of sacran and the positively charged surface of imogolite. UV–vis spectroscopy indicated that the LBL film exhibited good transparency. The surface morphology of the LBL film was smooth in the micrometer scale; many imogolite nanotubes were adsorbed onto the sacran layer, while no imogolite clusters were observed. Furthermore, the structure, stability, gas permeability, and mechanical properties of the LBL films were investigated.
- Open Access
- 25 October 2019
- Published by Springer Nature in Nature Communications
- Vol. 10 (1) , 1-7
A vertical silicon-graphene-germanium transistor
Graphene-base transistors have been proposed for high-frequency applications because of the negligible base transit time induced by the atomic thickness of graphene. However, generally used tunnel emitters suffer from high emitter potential-barrier-height which limits the transistor performance towards terahertz operation. To overcome this issue, a graphene-base heterojunction transistor has been proposed theoretically where the graphene base is sandwiched by silicon layers. Here we demonstrate a vertical silicon-graphene-germanium transistor where a Schottky emitter constructed by single-crystal silicon and single-layer graphene is achieved. Such Schottky emitter shows a current of 692 A cm−2and a capacitance of 41 nF cm−2, and thus the alpha cut-off frequency of the transistor is expected to increase from about 1 MHz by using the previous tunnel emitters to above 1 GHz by using the current Schottky emitter. With further engineering, the semiconductor-graphene-semiconductor transistor is expected to be one of the most promising devices for ultra-high frequency operation.
- 25 October 2019
- Published by Springer Nature in Nature Communications
- Vol. 10 (1) , 1-7
Open AccessA vertical silicon-graphene-germanium transistor
Graphene-base transistors have been proposed for high-frequency applications because of the negligible base transit time induced by the atomic thickness of graphene. However, generally used tunnel emitters suffer from high emitter potential-barrier-height which limits the transistor performance towards terahertz operation. To overcome this issue, a graphene-base heterojunction transistor has been proposed theoretically where the graphene base is sandwiched by silicon layers. Here we demonstrate a vertical silicon-graphene-germanium transistor where a Schottky emitter constructed by single-crystal silicon and single-layer graphene is achieved. Such Schottky emitter shows a current of 692 A cm−2and a capacitance of 41 nF cm−2, and thus the alpha cut-off frequency of the transistor is expected to increase from about 1 MHz by using the previous tunnel emitters to above 1 GHz by using the current Schottky emitter. With further engineering, the semiconductor-graphene-semiconductor transistor is expected to be one of the most promising devices for ultra-high frequency operation.
- Open Access
- 24 October 2019
- Published by Springer Nature in Nature Communications
- Vol. 10 (1) , 1-10
Ultrafast growth of nanocrystalline graphene films by quenching and grain-size-dependent strength and bandgap opening
Nanocrystallization is a well-known strategy to dramatically tune the properties of materials; however, the grain-size effect of graphene at the nanometer scale remains unknown experimentally because of the lack of nanocrystalline samples. Here we report an ultrafast growth of graphene films within a few seconds by quenching a hot metal foil in liquid carbon source. Using Pt foil and ethanol as examples, four kinds of nanocrystalline graphene films with average grain size of ~3.6, 5.8, 8.0, and 10.3 nm are synthesized. It is found that the effect of grain boundary becomes more pronounced at the nanometer scale. In comparison with pristine graphene, the 3.6 nm-grained film retains high strength (101 GPa) and Young’s modulus (576 GPa), whereas the electrical conductivity is declined by over 100 times, showing semiconducting behavior with a bandgap of ~50 meV. This liquid-phase precursor quenching method opens possibilities for ultrafast synthesis of typical graphene materials and other two-dimensional nanocrystalline materials.
- 24 October 2019
- Published by Springer Nature in Nature Communications
- Vol. 10 (1) , 1-10
Open AccessUltrafast growth of nanocrystalline graphene films by quenching and grain-size-dependent strength and bandgap opening
Nanocrystallization is a well-known strategy to dramatically tune the properties of materials; however, the grain-size effect of graphene at the nanometer scale remains unknown experimentally because of the lack of nanocrystalline samples. Here we report an ultrafast growth of graphene films within a few seconds by quenching a hot metal foil in liquid carbon source. Using Pt foil and ethanol as examples, four kinds of nanocrystalline graphene films with average grain size of ~3.6, 5.8, 8.0, and 10.3 nm are synthesized. It is found that the effect of grain boundary becomes more pronounced at the nanometer scale. In comparison with pristine graphene, the 3.6 nm-grained film retains high strength (101 GPa) and Young’s modulus (576 GPa), whereas the electrical conductivity is declined by over 100 times, showing semiconducting behavior with a bandgap of ~50 meV. This liquid-phase precursor quenching method opens possibilities for ultrafast synthesis of typical graphene materials and other two-dimensional nanocrystalline materials.
- Open Access
- 26 June 2019
- Published by Springer Nature in Nature Communications
- Vol. 10 (1) , 1-10
Interlayer epitaxy of wafer-scale high-quality uniform AB-stacked bilayer graphene films on liquid Pt3Si/solid Pt
Large-area high-quality AB-stacked bilayer graphene films are highly desired for the applications in electronics, photonics and spintronics. However, the existing growth methods can only produce discontinuous bilayer graphene with variable stacking orders because of the non-uniform surface and strong potential field of the solid substrates used. Here we report the growth of wafer-scale continuous uniform AB-stacked bilayer graphene films on a liquid Pt3Si/solid Pt substrate by chemical vapor deposition. The films show quality, mechanical and electrical properties comparable to the mechanically exfoliated samples. Growth mechanism studies show that the second layer is grown underneath the first layer by precipitation of carbon atoms from the solid Pt, and the small energy requirements for the movements of graphene nucleus on the liquid Pt3Si enables the interlayer epitaxy to form energy-favorable AB stacking. This interlayer epitaxy also allows the growth of ABA-stacked trilayer graphene and is applicable to other liquid/solid substrates.
- 26 June 2019
- Published by Springer Nature in Nature Communications
- Vol. 10 (1) , 1-10
Open AccessInterlayer epitaxy of wafer-scale high-quality uniform AB-stacked bilayer graphene films on liquid Pt3Si/solid Pt
Large-area high-quality AB-stacked bilayer graphene films are highly desired for the applications in electronics, photonics and spintronics. However, the existing growth methods can only produce discontinuous bilayer graphene with variable stacking orders because of the non-uniform surface and strong potential field of the solid substrates used. Here we report the growth of wafer-scale continuous uniform AB-stacked bilayer graphene films on a liquid Pt3Si/solid Pt substrate by chemical vapor deposition. The films show quality, mechanical and electrical properties comparable to the mechanically exfoliated samples. Growth mechanism studies show that the second layer is grown underneath the first layer by precipitation of carbon atoms from the solid Pt, and the small energy requirements for the movements of graphene nucleus on the liquid Pt3Si enables the interlayer epitaxy to form energy-favorable AB stacking. This interlayer epitaxy also allows the growth of ABA-stacked trilayer graphene and is applicable to other liquid/solid substrates.