Xiaodong Wang
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Previous Organizations / Institutes
The organizations / institutes from the scholar's other articles in the past ten years
Xiaodong Wang has a total of 200 co-authors. Here are the top co-authors by number of shared publications:
- Fuhua Yang
Engineering Research Center for Semiconductor Integrated Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, China
31 shared publications Fuhua Yang
Engineering Research Center for Semiconductor Integrated Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, People’s Republic of China
26 shared publicationsWen Liu
23 shared publications- Mingliang Zhang
Engineering Research Center for Semiconductor Integrated Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
12 shared publications Chunxue Ji
11 shared publications- Wen Liu
Engineering Research Center for Semiconductor Integrated Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
11 shared publications
Latest Publications
- 2 March 2026
- Published by Elsevier in Journal of Alloys and Compounds
- Vol. 1059
Experimental characterization of near-infrared absorption properties of InAs/GaAs quantum dots
- 2 March 2026
- Published by Elsevier in Journal of Alloys and Compounds
- Vol. 1059
Experimental characterization of near-infrared absorption properties of InAs/GaAs quantum dots
- 16 February 2026
- Published by Elsevier in Materials Science in Semiconductor Processing
- Vol. 208
Growth optimization of site controlled single InAs nanoisland arrays on patterned substrates
- 16 February 2026
- Published by Elsevier in Materials Science in Semiconductor Processing
- Vol. 208
Growth optimization of site controlled single InAs nanoisland arrays on patterned substrates
- 19 June 2025
- Published by Elsevier in Materials Science and Engineering: B
- Vol. 321
Design and optimization of In(Ga)As quantum dot single photon source based on air gap structure
- 19 June 2025
- Published by Elsevier in Materials Science and Engineering: B
- Vol. 321
Design and optimization of In(Ga)As quantum dot single photon source based on air gap structure
- Open Access
- 1 May 2025
- Published by IOP Publishing in Journal of Optics
- Vol. 27 (5) , 055001
Topological plasmonic one-dimensional nanocavity
In this paper, we propose a topological plasmonic 1D nanocavity, which comprises a dielectric nanoparticle chain placed on a metallic substrate. The structure is designed based on the topological characteristics of the plasmonic photonic crystals. A topological edge state exists at the interface between two distinct structures. In comparison to a non-topological defect mode, the topological edge mode exhibits better properties including good confinement and robustness against perturbations in scales and length–width ratio of the nanoparticles.
- 1 May 2025
- Published by IOP Publishing in Journal of Optics
- Vol. 27 (5) , 055001
Open AccessTopological plasmonic one-dimensional nanocavity
In this paper, we propose a topological plasmonic 1D nanocavity, which comprises a dielectric nanoparticle chain placed on a metallic substrate. The structure is designed based on the topological characteristics of the plasmonic photonic crystals. A topological edge state exists at the interface between two distinct structures. In comparison to a non-topological defect mode, the topological edge mode exhibits better properties including good confinement and robustness against perturbations in scales and length–width ratio of the nanoparticles.
- 18 April 2025
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 43 (3)
Proton irradiation effect on InAs/GaAs quantum dot solar cells
Quantum dot solar cells exhibit superior performance which can absorb low-energy photons and have less degradation in irradiation environments. In this paper, proton irradiated InAs/GaAs quantum dots and their solar cells are studied. The optical property shows that quantum dots exhibit higher radiation resistance compared to the wetting layer and GaAs bulk. Besides, the photoelectric character of solar cells further illustrates that the addition of quantum dots slows down the device’s performance degradation. Furthermore, results of external quantum efficiency reveal that the current generated by quantum dot layers hardly decreases after the irradiation. These findings show that the quantum dot solar cells have high radiation resistance and are promising to be used in a harsh environment.
- 18 April 2025
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 43 (3)
Proton irradiation effect on InAs/GaAs quantum dot solar cells
Quantum dot solar cells exhibit superior performance which can absorb low-energy photons and have less degradation in irradiation environments. In this paper, proton irradiated InAs/GaAs quantum dots and their solar cells are studied. The optical property shows that quantum dots exhibit higher radiation resistance compared to the wetting layer and GaAs bulk. Besides, the photoelectric character of solar cells further illustrates that the addition of quantum dots slows down the device’s performance degradation. Furthermore, results of external quantum efficiency reveal that the current generated by quantum dot layers hardly decreases after the irradiation. These findings show that the quantum dot solar cells have high radiation resistance and are promising to be used in a harsh environment.
- 17 January 2025
- Published by Elsevier in Journal of Alloys and Compounds
- Vol. 1014
Size-dependent phase evolution and electrical properties of Cu2-xTe thermoelectric nanofilms
- 17 January 2025
- Published by Elsevier in Journal of Alloys and Compounds
- Vol. 1014
Size-dependent phase evolution and electrical properties of Cu2-xTe thermoelectric nanofilms
- 8 January 2025
- Published by American Chemical Society (ACS) in ACS Applied Electronic Materials
- Vol. 7 (2) , 729-737
Engineering Low-Dimensional Cu2–xS for Superior Thermoelectric Performance
- 8 January 2025
- Published by American Chemical Society (ACS) in ACS Applied Electronic Materials
- Vol. 7 (2) , 729-737
Engineering Low-Dimensional Cu2–xS for Superior Thermoelectric Performance
- 7 January 2025
- Published by Optica Publishing Group in Optics Express
- Vol. 33 (1) , 858-866
A metasurface light-trapping structure for solar cell applications
Light trapping structures can enhance the absorption and reduce the thickness and costs of solar cells. Among light trapping structures, the metasurface structure utilizes Mie scattering to make light enter the solar active layer better, thus improving the photovoltaic conversion efficiency of solar cells. Herein, we simulated and optimized a metasurface light-trapping structure for solar cells and implemented this structure on solar cells. Simulation results of thin-film silicon-based solar cells show that the maximum short-circuit current can be increased to 24.46 mA/cm2 using a metasurface light-trapping structure, which is an increase of 40.49% compared to the reference bare cell. In addition, when this metasurface structure is integrated into a crystalline silicon solar cell, we find that the maximum short-circuits current reaches 29.09 mA/cm2, which is an even more significant improvement of 54.6% compared to the reference bare cell, and the power conversion efficiency increases by 7.14%. This study verifies the effect of a metasurface light-trapping structure on the light absorption of silicon-based solar cells.
- 7 January 2025
- Published by Optica Publishing Group in Optics Express
- Vol. 33 (1) , 858-866
A metasurface light-trapping structure for solar cell applications
Light trapping structures can enhance the absorption and reduce the thickness and costs of solar cells. Among light trapping structures, the metasurface structure utilizes Mie scattering to make light enter the solar active layer better, thus improving the photovoltaic conversion efficiency of solar cells. Herein, we simulated and optimized a metasurface light-trapping structure for solar cells and implemented this structure on solar cells. Simulation results of thin-film silicon-based solar cells show that the maximum short-circuit current can be increased to 24.46 mA/cm2 using a metasurface light-trapping structure, which is an increase of 40.49% compared to the reference bare cell. In addition, when this metasurface structure is integrated into a crystalline silicon solar cell, we find that the maximum short-circuits current reaches 29.09 mA/cm2, which is an even more significant improvement of 54.6% compared to the reference bare cell, and the power conversion efficiency increases by 7.14%. This study verifies the effect of a metasurface light-trapping structure on the light absorption of silicon-based solar cells.
- 18 November 2024
- Published by AIP Publishing in Applied Physics Letters
- Vol. 125 (21)
Polarization-insensitive bifocal metalenses by combining nanoimprint lithography and atomic layer deposition in the visible spectrum
Multifocal lenses are essential components for microscopy, spectroscopic detection, and optical trapping. Benefiting from the unprecedented capability of metasurfaces in light control, metalenses are able to provide multi-foci functionality with a more compact footprint, making them attractive alternatives to traditional bulky lenses. However, current manufacturing techniques encounter some challenges, including low throughput, high cost, and limited patterning areas. Here, we demonstrate the wafer-scale, low-cost, and high-throughput production of polarization-insensitive bifocal metalenses at a wavelength of 450 nm by combining nanoimprint lithography and atomic layer deposition. The nanoimprint process is simplified by using the imprinted resin itself as meta-atoms, which exhibit high aspect ratios (∼10:1) and small critical dimensions (∼90 nm). The effective refractive index of the meta-atoms is increased through atomic layer deposition of the high-index TiO2 film, providing 0–1.5π sufficient phase coverage. Metalenses with diameters of 480 μm are fabricated on the silica substrate, exhibiting two diffraction-limited focal spots along the optical axis. Moreover, the fabricated metalenses demonstrate the polarization-insensitive feature under various polarization states. The fabrication process presented in this Letter paves the way for large-scale and low-cost production of versatile metasurfaces operating in the visible or shorter spectrum.
- 18 November 2024
- Published by AIP Publishing in Applied Physics Letters
- Vol. 125 (21)
Polarization-insensitive bifocal metalenses by combining nanoimprint lithography and atomic layer deposition in the visible spectrum
Multifocal lenses are essential components for microscopy, spectroscopic detection, and optical trapping. Benefiting from the unprecedented capability of metasurfaces in light control, metalenses are able to provide multi-foci functionality with a more compact footprint, making them attractive alternatives to traditional bulky lenses. However, current manufacturing techniques encounter some challenges, including low throughput, high cost, and limited patterning areas. Here, we demonstrate the wafer-scale, low-cost, and high-throughput production of polarization-insensitive bifocal metalenses at a wavelength of 450 nm by combining nanoimprint lithography and atomic layer deposition. The nanoimprint process is simplified by using the imprinted resin itself as meta-atoms, which exhibit high aspect ratios (∼10:1) and small critical dimensions (∼90 nm). The effective refractive index of the meta-atoms is increased through atomic layer deposition of the high-index TiO2 film, providing 0–1.5π sufficient phase coverage. Metalenses with diameters of 480 μm are fabricated on the silica substrate, exhibiting two diffraction-limited focal spots along the optical axis. Moreover, the fabricated metalenses demonstrate the polarization-insensitive feature under various polarization states. The fabrication process presented in this Letter paves the way for large-scale and low-cost production of versatile metasurfaces operating in the visible or shorter spectrum.
- 11 November 2024
- Published by IOP Publishing in Nanotechnology
- Vol. 36 (5) , 052001
Site-controlled growth of In(Ga)As/GaAs quantum dots on patterned substrate
In(Ga)As quantum dot (QD) with uniform size and controlled sites have great potential in optical communications and quantum computing. In this review, we focus on the site-controlled preparation of In(Ga)As quantum dot arrays based on patterned substrates, including the improvements made by the researchers to enhance the quantum dot site-control capability and optical quality. Based on the current research on site-controlled In(Ga)As QDs, it has been possible to grow uniformly ordered In(Ga)As QD arrays, in which the size, morphology, and nucleus location of each quantum dot can be precisely controlled. In addition, the study of deoxidation treatment of patterned substrates has led to the performance enhancement of the prepared QD arrays. Finally, we propose that the future development of site-controlled In(Ga)As QD arrays lies in improving the optical quality and tuning their emission wavelength to the telecommunication band.
- 11 November 2024
- Published by IOP Publishing in Nanotechnology
- Vol. 36 (5) , 052001
Site-controlled growth of In(Ga)As/GaAs quantum dots on patterned substrate
In(Ga)As quantum dot (QD) with uniform size and controlled sites have great potential in optical communications and quantum computing. In this review, we focus on the site-controlled preparation of In(Ga)As quantum dot arrays based on patterned substrates, including the improvements made by the researchers to enhance the quantum dot site-control capability and optical quality. Based on the current research on site-controlled In(Ga)As QDs, it has been possible to grow uniformly ordered In(Ga)As QD arrays, in which the size, morphology, and nucleus location of each quantum dot can be precisely controlled. In addition, the study of deoxidation treatment of patterned substrates has led to the performance enhancement of the prepared QD arrays. Finally, we propose that the future development of site-controlled In(Ga)As QD arrays lies in improving the optical quality and tuning their emission wavelength to the telecommunication band.