Yantao Li

High-power impulse magnetron sputtering (HiPIMS) technology was used to deposit Ti-Nb-Cr films on Si (100) and 316L substrates by changing the peak power of the Ti-Nb-Cr target. Optical emission spectroscopy (OES) was used to study the effect of peak power on the ion atomic arrival ratio in front of the substrate. Experimental instruments such as an X-ray diffraction (XRD) device, scanning electron microscope (SEM), transmission electron microscope (TEM), nanohardness tester, ball-disk reciprocating friction machine, and electrochemical workstation were used to study the effects of the atomic arrival ratio of Ti, Nb, and Cr ions on the microstructure, mechanical properties, and corrosion resistance of Ti-Nb-Cr films. The results show that when the peak power is 67.84 kW, the ion atomic arrival ratio of Ti reaches 47.57%, the ion atomic arrival ratio of Nb reaches 39.41%, and the ion atomic arrival ratio of Cr reaches 10.6%. The ion atomic arrival ratio is doubled compared to the peak power of 51.04 kW. The films prepared at different peak powers all show diffraction peaks of the BCC structure. At high power levels, the TiNbCr films exhibit reduced residual compressive stress, although this may be accompanied by lower hardness and wear resistance.

The (AlFeCoNi)C high-entropy alloy carbide films (HECFs) with tunable carbon contents were fabricated by magnetron sputtering to investigate the carbon-driven structural evolution and its coupling effects on mechanical and chemical properties. With increasing carbon incorporation (0–47.6 at.%), the HECFs formed a composite structure of amorphous phase and BCC nanocrystalline phase, as evidenced by XRD and TEM. Atom probe tomography (APT) reveals Al segregation in the film. Remarkably, the wear rate decreases exponentially from 4.8 × 10⁻⁵ to 6.7 × 10⁻⁶ mm³/N·m, attributed to the amorphous carbon phase acting as solid lubricant. Simultaneously, the corrosion current density reduces by two orders of magnitude (7.2 × 10⁻⁸ A/cm² in 3.5% NaCl), benefiting from the amorphous network inhibiting ion diffusion pathways. This work establishes a carbon-content–property correlation paradigm for designing multifunctional HEA films in extreme environments.

The (AlFeCoNi)C high-entropy alloy carbide films (HECFs) with tunable carbon contents were fabricated by magnetron sputtering to investigate the carbon-driven structural evolution and its coupling effects on mechanical and chemical properties. With increasing carbon incorporation (0-47.6 at.%), the HECFs formed a composite structure of amorphous phase and BCC nanocrystalline phase, as evidenced by XRD and TEM. Atom probe tomography (APT) reveals Al segregation in the film. Remarkably, the wear rate decreases exponentially from 5.3×10⁻⁵ to 1.3×10⁻5 mm³/N·m, attributed to the amorphous carbon phase acting as solid lubricant. Simultaneously, the corrosion current density reduces by two orders of magnitude (7.2×10⁻⁸ A/cm² in 3.5% NaCl), benefiting from the amorphous network inhibiting ion diffusion pathways. This work establishes a carbon-content-property correlation paradigm for designing multifunctional HEA films in extreme environments.

The (TiNbZrCr)N_x high-entropy nitride films (HENFs) were prepared by high-power pulsed magnetron sputtering (HPPMS). The effect of the N₂ flow rate (F_N) on the HPPMS plasma discharge, film composition, microstructure, residual stress, tribological properties, and corrosion resistance was investigated. Results show that, with the increase in F_N, plasma discharge is enhanced. Firstly, the introduced N atoms react with Ti, Nb, Cr, and Zr to form an FCC nitride phase structure. Then, with the increase in plasma bombardment on the deposited film, the HENFs undergo amorphization to form an FCC+ amorphous structure, accompanied by a decrease in grain size and a change in the preferred orientation from (1 1 1) to (2 0 0). The HENFs deposited at F_N = 8 sccm show the highest hardness of 27.8 GPa. The HENFs deposited at F_N = 12 sccm present the best tribological properties, with a low wear rate of 4.0 × 10⁻⁶ mm³N⁻¹m⁻¹. The corrosion resistance of the (TiNbZrCr)N_x HENFs shows a strong correlation with the amorphous phase. The corrosion resistance of the FCC nitride film is the worst, and the corrosion resistance gradually increases with the amorphous transformation of the film. Based on the above results, nanocomposite high-entropy films can be prepared using HPPMS technology and exhibit excellent, comprehensive performance.

Titanium thin films are particularly important as electrode layers, barrier layers, or intermediate buffer layers in the semiconductor industry. In order to improve the quality of Ti thin films and the adhesion and diffraction abilities of irregular parts, this paper used high-power pulsed magnetron sputtering (HPPMS/HiPIMS) to prepare titanium thin films. The effects of different trigger voltages (700 V, 800 V, and 900 V) on plasma properties were studied, and the microstructure, mechanical properties and corrosion resistance of the films were also studied. The results showed that as the voltage increased, the grain size of the thin films gradually increased. The residual stress of the titanium films changed from compressive stress (−333 MPa) to tensile stress (55 MPa) and then to low compressive stress (−178 MPa). The hardness values were 13 GPa, 9.45 GPa and 6.62 GPa, respectively. The wear resistance of the films gradually decreased, while the toughness gradually increased. The corrosion resistance of the films decreased as well.

Titanium nitride (TiN) thin films deposited by high-power pulsed magnetron sputtering usually have a high compressive residual stress, which is not conducive for the adherence of TiN thin films. This study investigated the potential of Ti₂AlN for releasing the compressive residual stress of HPPMS-deposited TiN thin films and evaluated the adherence strength and hardness of TiN/Ti₂AlN multilayers by introducing the Ti₂AlN MAX phase to form TiN/Ti₂AlN multilayers. The results showed that smooth TiN/Ti₂AlN multilayers with the TiN (111) and Ti₂AlN (002) textures were successfully synthesized by HPPMS deposition and subsequent vacuum annealing. The compressive residual stress in TiN was released by Ti₂AlN. The adherence strength of the TiN/Ti₂AlN multilayers was improved after the release of the compressive residual stress, and the hardness of TiN/Ti₂AlN multilayers was close to the annealed TiN. This study provides a novel approach for releasing the residual stress of hard ceramic thin films using the MAX phase.