Yi-Wei Tsai
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Previous Organizations / Institutes
The organizations / institutes from the scholar's other articles in the past ten years
Yi-Wei Tsai has a total of 162 co-authors. Here are the top co-authors by number of shared publications:
- Shih-Lin Chang
National Synchrotron Radiation Research Center, Hsinchu 300, Taiwan
10 shared publications - Jhih-Min Lin
National Synchrotron Radiation Research Center, Hsinchu 300, Taiwan
6 shared publications Wen-Chung Liu
Department of Physics, National Tsing Hua University, Hsinchu 300, Taiwan
5 shared publicationsYu-Hsin Wu
Center for Measurement Standards, Industrial Technology Research Institute, Hsinchu 300, Taiwan
5 shared publications- Yu-Shan Huang
National Synchrotron Radiation Research Center, Hsinchu 300, Taiwan
5 shared publications Ying-Yi Chang
National Synchrotron Radiation Research Center, Hsinchu 300, Taiwan
4 shared publications
Latest Publications
- Open Access
- 27 October 2026
- Published by International Union of Crystallography (IUCr) in Journal of Applied Crystallography
- Vol. 59 (6)
Experimental observation of grazing-incidence X-ray back-diffraction with large angular dispersion
We report the first experimental observation of grazing-incidence X-ray back-diffraction (GIXBD) exhibiting exceptionally large angular dispersion. An angular dispersion rate (ADR) of 44.4 ± 9.3 µrad meV −1 was measured from a Si (12 4 0) crystal with a surface miscut angle of 89.926°, representing the largest ADR reported for X-ray back-diffraction. The observed diffraction behaviour is quantitatively reproduced by the full dynamical theory of X-ray diffraction. A kinematic formulation based on Snell's law provides a simple geometrical interpretation of the grazing-incidence limit beyond the conventional DuMond analysis and predicts a large but finite ADR, thereby avoiding the apparent divergence of the conventional treatment. These results provide the first experimental validation of GIXBD, establish a physically consistent description of angular dispersion in the extreme grazing-incidence limit and provide a sound physical basis for future ultra-high-resolution crystal X-ray optics.
- 27 October 2026
- Published by International Union of Crystallography (IUCr) in Journal of Applied Crystallography
- Vol. 59 (6)
Open AccessExperimental observation of grazing-incidence X-ray back-diffraction with large angular dispersion
We report the first experimental observation of grazing-incidence X-ray back-diffraction (GIXBD) exhibiting exceptionally large angular dispersion. An angular dispersion rate (ADR) of 44.4 ± 9.3 µrad meV −1 was measured from a Si (12 4 0) crystal with a surface miscut angle of 89.926°, representing the largest ADR reported for X-ray back-diffraction. The observed diffraction behaviour is quantitatively reproduced by the full dynamical theory of X-ray diffraction. A kinematic formulation based on Snell's law provides a simple geometrical interpretation of the grazing-incidence limit beyond the conventional DuMond analysis and predicts a large but finite ADR, thereby avoiding the apparent divergence of the conventional treatment. These results provide the first experimental validation of GIXBD, establish a physically consistent description of angular dispersion in the extreme grazing-incidence limit and provide a sound physical basis for future ultra-high-resolution crystal X-ray optics.
- Open Access
- 20 March 2026
- Published by International Union of Crystallography (IUCr) in Journal of Synchrotron Radiation
- Vol. 33 (3) , 841-847
The hard X-ray ptychography endstation at the Taiwan Photon Source
Following our initial demonstration of ptychography at the Taiwan Photon Source (TPS), the system has been substantially upgraded. This article details the design and performance of the new hard X-ray 2D ptychography endstation, TPS 25A2. A zone-plate focusing system has been inserted downstream of the previous Kirkpatrick–Baez mirror optics at the TPS 25A2 beamline. Operating at a photon energy of 8.979 keV, the endstation routinely achieves a spatial resolution of sub-10 nm in 2D, with a highest achieved resolution of 6.9 nm on a standard Siemens star test pattern. We present the full instrumental specifications and performance benchmarks, and showcase the endstation's capabilities with imaging examples of inorganic nanoparticles and a complex biological structure. The establishment of TPS 25A2 provides the scientific community with a powerful and accessible tool for nanoscale imaging.
- 20 March 2026
- Published by International Union of Crystallography (IUCr) in Journal of Synchrotron Radiation
- Vol. 33 (3) , 841-847
Open AccessThe hard X-ray ptychography endstation at the Taiwan Photon Source
Following our initial demonstration of ptychography at the Taiwan Photon Source (TPS), the system has been substantially upgraded. This article details the design and performance of the new hard X-ray 2D ptychography endstation, TPS 25A2. A zone-plate focusing system has been inserted downstream of the previous Kirkpatrick–Baez mirror optics at the TPS 25A2 beamline. Operating at a photon energy of 8.979 keV, the endstation routinely achieves a spatial resolution of sub-10 nm in 2D, with a highest achieved resolution of 6.9 nm on a standard Siemens star test pattern. We present the full instrumental specifications and performance benchmarks, and showcase the endstation's capabilities with imaging examples of inorganic nanoparticles and a complex biological structure. The establishment of TPS 25A2 provides the scientific community with a powerful and accessible tool for nanoscale imaging.
- 24 February 2026
- Published by Optica Publishing Group in Optics Express
- Vol. 34 (5) , 7650-7661
Mitigation and quantification of high-frequency instabilities using progressive filtering in burst-mode ptychography
Ptychography is a powerful lensless imaging technique that reconstructs high-resolution images from diffraction patterns. While widely adopted across scientific fields, ptychography is highly sensitive to system instabilities. These instabilities are typically categorized by their frequency relative to the exposure time: low-frequency instabilities, such as beam variations and position errors, can be mitigated effectively, but high-frequency instabilities remain challenging. Here, we present an alternative approach that exploits the burst-mode capability of modern detectors to perform progressive filtering (PF) ptychography, utilizing a temporally oversampled dataset. Applied to a standard Siemens star sample, our method improved the spatial resolution from 30.2 nm to 9.5 nm. Furthermore, we characterize the high-frequency instabilities, revealing a typical length scale of 33 nm and characteristic frequencies of 29 and 38 Hz.
- 24 February 2026
- Published by Optica Publishing Group in Optics Express
- Vol. 34 (5) , 7650-7661
Mitigation and quantification of high-frequency instabilities using progressive filtering in burst-mode ptychography
Ptychography is a powerful lensless imaging technique that reconstructs high-resolution images from diffraction patterns. While widely adopted across scientific fields, ptychography is highly sensitive to system instabilities. These instabilities are typically categorized by their frequency relative to the exposure time: low-frequency instabilities, such as beam variations and position errors, can be mitigated effectively, but high-frequency instabilities remain challenging. Here, we present an alternative approach that exploits the burst-mode capability of modern detectors to perform progressive filtering (PF) ptychography, utilizing a temporally oversampled dataset. Applied to a standard Siemens star sample, our method improved the spatial resolution from 30.2 nm to 9.5 nm. Furthermore, we characterize the high-frequency instabilities, revealing a typical length scale of 33 nm and characteristic frequencies of 29 and 38 Hz.
- Open Access
- 1 January 2025
- Published by International Union of Crystallography (IUCr) in Journal of Synchrotron Radiation
- Vol. 32 (1) , 217-224
High-resolution imaging of organic and inorganic nanoparticles at nanometre-scale resolution by X-ray ensemble diffraction microscopy
Coherent diffraction microscopy (CDM) is a robust direct imaging method due to its unique 2D/3D phase retrieval capacity. Nonetheless, its resolution faces limitations due to a diminished signal-to-noise ratio (SNR) in high-frequency regions. Addressing this challenge, X-ray ensemble diffraction microscopy (XEDM) emerges as a viable solution, ensuring an adequate SNR in high-frequency regions and effectively surmounting resolution constraints. In this article, two experiments were conducted to underscore XEDM's superior spatial resolution capabilities. These experiments employed 55 nm-sized silicon–gold nanoparticles (NPs) and 19 nm-sized nodavirus-like particles (NV-LPs) on the coherent X-ray scattering beamline of the Taiwan Photon Source. The core–shell density distribution of the silicon–gold NPs was successfully obtained with a radial resolution of 3.4 nm per pixel, while NV-LPs in solution were reconstructed at a radial resolution of 1.3 nm per pixel. The structural information was directly retrieved from the diffraction intensities without prior knowledge and was subsequently confirmed through transmission electron microscopy.
- 1 January 2025
- Published by International Union of Crystallography (IUCr) in Journal of Synchrotron Radiation
- Vol. 32 (1) , 217-224
Open AccessHigh-resolution imaging of organic and inorganic nanoparticles at nanometre-scale resolution by X-ray ensemble diffraction microscopy
Coherent diffraction microscopy (CDM) is a robust direct imaging method due to its unique 2D/3D phase retrieval capacity. Nonetheless, its resolution faces limitations due to a diminished signal-to-noise ratio (SNR) in high-frequency regions. Addressing this challenge, X-ray ensemble diffraction microscopy (XEDM) emerges as a viable solution, ensuring an adequate SNR in high-frequency regions and effectively surmounting resolution constraints. In this article, two experiments were conducted to underscore XEDM's superior spatial resolution capabilities. These experiments employed 55 nm-sized silicon–gold nanoparticles (NPs) and 19 nm-sized nodavirus-like particles (NV-LPs) on the coherent X-ray scattering beamline of the Taiwan Photon Source. The core–shell density distribution of the silicon–gold NPs was successfully obtained with a radial resolution of 3.4 nm per pixel, while NV-LPs in solution were reconstructed at a radial resolution of 1.3 nm per pixel. The structural information was directly retrieved from the diffraction intensities without prior knowledge and was subsequently confirmed through transmission electron microscopy.
- Open Access
- 5 August 2024
- Published by International Union of Crystallography (IUCr) in Journal of Synchrotron Radiation
- Vol. 31 (5) , 1340-1345
Using convolutional neural network denoising to reduce ambiguity in X-ray coherent diffraction imaging
The inherent ambiguity in reconstructed images from coherent diffraction imaging (CDI) poses an intrinsic challenge, as images derived from the same dataset under varying initial conditions often display inconsistencies. This study introduces a method that employs the Noise2Noise approach combined with neural networks to effectively mitigate these ambiguities. We applied this methodology to hundreds of ambiguous reconstructed images retrieved from a single diffraction pattern using a conventional retrieval algorithm. Our results demonstrate that ambiguous features in these reconstructions are effectively treated as inter-reconstruction noise and are significantly reduced. The post-Noise2Noise treated images closely approximate the average and singular value decomposition analysis of various reconstructions, providing consistent and reliable reconstructions.
- 5 August 2024
- Published by International Union of Crystallography (IUCr) in Journal of Synchrotron Radiation
- Vol. 31 (5) , 1340-1345
Open AccessUsing convolutional neural network denoising to reduce ambiguity in X-ray coherent diffraction imaging
The inherent ambiguity in reconstructed images from coherent diffraction imaging (CDI) poses an intrinsic challenge, as images derived from the same dataset under varying initial conditions often display inconsistencies. This study introduces a method that employs the Noise2Noise approach combined with neural networks to effectively mitigate these ambiguities. We applied this methodology to hundreds of ambiguous reconstructed images retrieved from a single diffraction pattern using a conventional retrieval algorithm. Our results demonstrate that ambiguous features in these reconstructions are effectively treated as inter-reconstruction noise and are significantly reduced. The post-Noise2Noise treated images closely approximate the average and singular value decomposition analysis of various reconstructions, providing consistent and reliable reconstructions.
- Open Access
- 13 March 2023
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Photonics Journal
- Vol. 15 (2) , 1-4
Ensemble Diffraction Microscopy: An Imaging Technique That Allows High-Resolution Diffraction Imaging Using Both Totally and Partially Coherent Sources
Coherent diffraction microscopy (CDM) is a potential approach to image micromaterials at atomic resolution without crystals. Due to the lack of high-angle scattering, the achieved resolution is limited to several nanometers. Small-angle scattering allows researchers to reveal high-resolution 3D structures of specimens by fitting 1D diffraction signals. However, prerequisite 3D models and non-unique solutions restrict the potential to image general specimens. Under the assumption of an ensemble containing large amounts of identical specimens with the same orientation, the intensity distribution of the diffraction pattern of the whole ensemble is approximated to the form factor of a single specimen multiplied by the number of identical specimens. Since the diffraction intensities are contributed from the whole ensemble, the signal can be significantly extended to high-frequency regions. The feasibility of ensemble diffraction microscopy (EDM) was demonstrated by a designed sample using both totally and partially coherent x-ray sources at Taiwan Photon Source (TPS). The reconstructed images show excellent consistency with the image of a scanning electron microscope. This work represents a new protocol for directly characterizing the structures of nanomaterials, or potentially biomacromolecules, from accumulated x-ray scattering data.
- 13 March 2023
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Photonics Journal
- Vol. 15 (2) , 1-4
Open AccessEnsemble Diffraction Microscopy: An Imaging Technique That Allows High-Resolution Diffraction Imaging Using Both Totally and Partially Coherent Sources
Coherent diffraction microscopy (CDM) is a potential approach to image micromaterials at atomic resolution without crystals. Due to the lack of high-angle scattering, the achieved resolution is limited to several nanometers. Small-angle scattering allows researchers to reveal high-resolution 3D structures of specimens by fitting 1D diffraction signals. However, prerequisite 3D models and non-unique solutions restrict the potential to image general specimens. Under the assumption of an ensemble containing large amounts of identical specimens with the same orientation, the intensity distribution of the diffraction pattern of the whole ensemble is approximated to the form factor of a single specimen multiplied by the number of identical specimens. Since the diffraction intensities are contributed from the whole ensemble, the signal can be significantly extended to high-frequency regions. The feasibility of ensemble diffraction microscopy (EDM) was demonstrated by a designed sample using both totally and partially coherent x-ray sources at Taiwan Photon Source (TPS). The reconstructed images show excellent consistency with the image of a scanning electron microscope. This work represents a new protocol for directly characterizing the structures of nanomaterials, or potentially biomacromolecules, from accumulated x-ray scattering data.
- Open Access
- 18 April 2022
- Published by AIP Publishing in Applied Physics Letters
- Vol. 120 (16) , 162102
van der Waals epitaxy of 2D h-AlN on TMDs by atomic layer deposition at 250 °C
We report the demonstration of growing two-dimensional (2D) hexagonal-AlN (h-AlN) on transition metal dichalcogenide (TMD) monolayers (MoS2, WS2, and WSe2) via van der Waals epitaxy by atomic layer deposition (ALD). Having atomically thin thickness and high theoretical carrier mobility, TMDs are attractive semiconductors for future dense and high-performance 3D IC, and 2D hexagonal boron nitride (h-BN) as a gate dielectric is known to significantly improve TMD device performance. However, h-BN growth requires 1000 °C temperature that is not compatible with CMOS fabrication, and ALD deposition of any high-k 2D insulator on TMD continues to be an elusive goal. The epitaxial 2D layered h-AlN by low-temperature ALD is characterized by synchrotron-based grazing-incidence wide-angle x-ray scattering and high-resolution transmission electron microscopy. In addition, we demonstrate the feasibility of using layered h-AlN as an interfacial layer between WS2 and ALD HfO2. The significantly better uniformity and smoothness of HfO2 than that directly deposited on TMD are desirable characteristics for TMD transistor applications.
- 18 April 2022
- Published by AIP Publishing in Applied Physics Letters
- Vol. 120 (16) , 162102
Open Accessvan der Waals epitaxy of 2D h-AlN on TMDs by atomic layer deposition at 250 °C
We report the demonstration of growing two-dimensional (2D) hexagonal-AlN (h-AlN) on transition metal dichalcogenide (TMD) monolayers (MoS2, WS2, and WSe2) via van der Waals epitaxy by atomic layer deposition (ALD). Having atomically thin thickness and high theoretical carrier mobility, TMDs are attractive semiconductors for future dense and high-performance 3D IC, and 2D hexagonal boron nitride (h-BN) as a gate dielectric is known to significantly improve TMD device performance. However, h-BN growth requires 1000 °C temperature that is not compatible with CMOS fabrication, and ALD deposition of any high-k 2D insulator on TMD continues to be an elusive goal. The epitaxial 2D layered h-AlN by low-temperature ALD is characterized by synchrotron-based grazing-incidence wide-angle x-ray scattering and high-resolution transmission electron microscopy. In addition, we demonstrate the feasibility of using layered h-AlN as an interfacial layer between WS2 and ALD HfO2. The significantly better uniformity and smoothness of HfO2 than that directly deposited on TMD are desirable characteristics for TMD transistor applications.
- 13 September 2021
- Published by International Union of Crystallography (IUCr) in Journal of Synchrotron Radiation
- Vol. 28 (6) , 1921-1926
Hard X-ray ptychography at Taiwan Photon Source at 11–20 nm spatial resolution
X-ray ptychography, a technique based on scanning and processing of coherent diffraction patterns, is a non-destructive imaging technique with a high spatial resolution far beyond the focused beam size. Earlier demonstrations of hard X-ray ptychography at Taiwan Photon Source (TPS) using an in-house program successfully recorded the ptychographic diffraction patterns from a gold-made Siemens star as a test sample and retrieved the finest inner features of 25 nm. Ptychography was performed at two beamlines with different focusing optics: a pair of Kirkpatrick–Baez mirrors and a pair of nested Montel mirrors, for which the beam sizes on the focal planes were 3 µm and 200 nm and the photon energies were from 5.1 keV to 9 keV. The retrieved spatial resolutions are 20 nm to 11 nm determined by the 10–90% line-cut method and half-bit threshold of Fourier shell correlation. This article describes the experimental conditions and compensation methods, including position correction, mixture state-of-probe, and probe extension methods, of the aforementioned experiments. The discussions will highlight the criteria of ptychographic experiments at TPS as well as the opportunity to characterize beamlines by measuring factors such as the drift or instability of beams or stages and the coherence of beams. Besides, probe functions, the full complex fields illuminated on samples, can be recovered simultaneously using ptychography. Theoretically, the wavefield at any arbitrary position can be estimated from one recovered probe function undergoing wave-propagating. The verification of probe-propagating has been carried out by comparing the probe functions obtained by ptychography and undergoing wave-propagating located at 0, 500 and 1000 µm relative to the focal plane.
- 13 September 2021
- Published by International Union of Crystallography (IUCr) in Journal of Synchrotron Radiation
- Vol. 28 (6) , 1921-1926
Hard X-ray ptychography at Taiwan Photon Source at 11–20 nm spatial resolution
X-ray ptychography, a technique based on scanning and processing of coherent diffraction patterns, is a non-destructive imaging technique with a high spatial resolution far beyond the focused beam size. Earlier demonstrations of hard X-ray ptychography at Taiwan Photon Source (TPS) using an in-house program successfully recorded the ptychographic diffraction patterns from a gold-made Siemens star as a test sample and retrieved the finest inner features of 25 nm. Ptychography was performed at two beamlines with different focusing optics: a pair of Kirkpatrick–Baez mirrors and a pair of nested Montel mirrors, for which the beam sizes on the focal planes were 3 µm and 200 nm and the photon energies were from 5.1 keV to 9 keV. The retrieved spatial resolutions are 20 nm to 11 nm determined by the 10–90% line-cut method and half-bit threshold of Fourier shell correlation. This article describes the experimental conditions and compensation methods, including position correction, mixture state-of-probe, and probe extension methods, of the aforementioned experiments. The discussions will highlight the criteria of ptychographic experiments at TPS as well as the opportunity to characterize beamlines by measuring factors such as the drift or instability of beams or stages and the coherence of beams. Besides, probe functions, the full complex fields illuminated on samples, can be recovered simultaneously using ptychography. Theoretically, the wavefield at any arbitrary position can be estimated from one recovered probe function undergoing wave-propagating. The verification of probe-propagating has been carried out by comparing the probe functions obtained by ptychography and undergoing wave-propagating located at 0, 500 and 1000 µm relative to the focal plane.
- 10 May 2021
- Published by American Chemical Society (ACS) in ACS Applied Energy Materials
- Vol. 4 (5) , 5132-5142
Regulated Li Electrodeposition Behavior through Mesoporous Silica Thin Film in Anode-Free Lithium Metal Batteries
- 10 May 2021
- Published by American Chemical Society (ACS) in ACS Applied Energy Materials
- Vol. 4 (5) , 5132-5142
Regulated Li Electrodeposition Behavior through Mesoporous Silica Thin Film in Anode-Free Lithium Metal Batteries