EHE. Huang

E. Huang

*This is an algorithmically generated author record based on publicly available information.

Current Organizations / Institutes

The organizations/institutes from the scholar's latest article


E. Huang has a total of 22 co-authors. Here are the top co-authors by number of shared publications:


Latest Publications

  • Open Access

    Merged-Element Transmons: Design and Qubit Performance

    by H. J. Mamin, E. Huang, S. Carnevale, C. T. Rettner, N. Arellano, M. H. Sherwood, C. Kurter, B. Trimm, M. Sandberg, R. M. Shelby, et al.

    We have demonstrated a novel type of superconducting transmon qubit in which a Josephson junction has been engineered to act as its own parallel shunt capacitor. This merged-element transmon (MET) potentially offers a smaller footprint and simpler fabrication than conventional transmons. Because it concentrates the electromagnetic energy inside the junction, it reduces relative electric field participation from other interfaces. By combining micrometer-scale Al/AlOx/Al junctions with long oxidations and novel processing, we have produced functional devices with $E_{J}$/$E_{C}$ in the low transmon regime ($E_{J}$/$E_{C}$ $\lesssim$30). Cryogenic I-V measurements show sharp dI/dV structure with low sub-gap conduction. Qubit spectroscopy of tunable versions show a small number of avoided level crossings, suggesting the presence of two-level systems (TLS). We have observed mean T1 times typically in the range of 10-90 microseconds, with some annealed devices exhibiting T1 > 100 microseconds over several hours. The results suggest that energy relaxation in conventional, small-junction transmons is not limited by junction loss.

  • Merged-Element Transmons: Design and Qubit Performance

    by H.J. Mamin, E. Huang, S. Carnevale, C.T. Rettner, N. Arellano, M.H. Sherwood, C. Kurter, B. Trimm, M. Sandberg, R.M. Shelby, et al.

    We demonstrate a superconducting transmon qubit in which a Josephson junction has been engineered to act as its own parallel shunt capacitor. This merged-element transmon potentially offers a smaller footprint than conventional transmons. Because it concentrates the electromagnetic energy inside the junction, it reduces the relative electric field participation from other interfaces. By combining micrometer-scale Al/AlOx/Al junctions with long oxidations, we produce functional devices with EJ/EC in the low-transmon regime (EJ/EC≲30). Cryogenic I-V measurements show a sharp dI/dV structure with low subgap conduction. Qubit spectroscopy of tunable versions shows a small number of avoided level crossings, suggesting the presence of two-level systems. We observe mean T1 times typically in the range of 10–90μs, with some annealed devices exhibiting T1>100μs over several hours. The results suggest that energy relaxation in conventional small-junction transmons is not limited by junction loss.