VPVincent Pasquier

Vincent Pasquier

*This is an algorithmically generated author record based on publicly available information.

Current Organizations / Institutes

The organizations/institutes from the scholar's latest article


Vincent Pasquier has a total of 12 co-authors. Here are the top co-authors by number of shared publications:


Latest Publications

  • Feedback loop dependent charge density wave imaging by scanning tunneling spectroscopy

    by Alessandro Scarfato, Árpád Pásztor, Lihuan Sun, Ivan Maggio-Aprile, Vincent Pasquier, Tejas Parasram Singar, Andreas Ørsted, Ishita Pushkarna, Marcello Spera, Enrico Giannini, et al.

    Scanning tunneling spectroscopy (STS) is a unique technique to probe the local density of states (LDOS) at the atomic scale by measuring the tunneling conductance between a sharp tip and a sample surface. However, the technique suffers of well-known limitations, the so-called set-point effect, which can potentially introduce artifacts in the measurements. We compare several STS imaging schemes applied to the LDOS modulations of the charge density wave state on atomically flat surfaces, and we demonstrate that only constant-height STS is capable of mapping the intrinsic LDOS. In the constant-current STS, commonly used and easier to implement, the tip-sample distance variations imposed by the feedback loop result in set-point-dependent STS images and possibly mislead the identification of the CDW gap edges.


  • Open Access

    Tunable biaxial strain device for low-dimensional materials

    by Vincent Pasquier, Alessandro Scarfato, Jose Martinez-Castro, Antoine Guipet, Christoph Renner

    Strain is attracting much interest as a mean to tune the properties of thin exfoliated two-dimensional materials and their heterostructures. Numerous devices to apply tunable uniaxial strain are proposed in the literature, but only few for biaxial strain, often with a trade-off between maximum strain and uniformity, reversibility, and device size. We present a compact device that allows for the controlled application of uniform in-plane biaxial strain, with maximum deformation and uniformity comparable to those found in much larger devices. Its performance and strain uniformity over the sample area are modeled using finite element analysis and demonstrated by measuring the response of exfoliated 2H–MoS2 to strain by Raman spectroscopy.