Renzhong Tai

Sparse-scan ptychography accelerates data acquisition but compromises the overlap-induced redundancy essential for stable blind reconstruction. In low-overlap cases, object errors are often transferred to the probe update, causing crosstalk and artifacts. In this work, we propose a sparse-scan ptychography method termed hybrid-scan ptychography, which combines a hybrid-overlap scanning strategy with a reference-guided ePIE reconstruction algorithm. In this method, a localized high-overlap scan is used to establish a reliable probe estimate for reconstructing a wide field of view scanned on a low-overlap grid. As a stabilizing prior, this probe estimate is integrated into the ePIE probe update for the low-overlap region through an additional quadratic regularization term, thereby ensuring accurate probe reconstruction for sparse-scan region. This method effectively suppresses sparse-scan artifacts and ensures robust, high-fidelity reconstruction, as demonstrated by numerical simulations and soft X-ray ptychography experiments. With the new method, the acquisition efficiency of ptychography can be increased by at least 2 times without significant resolution reduction.

In the context of the global big data deluge, concerted efforts are being made to address the challenges faced by large scientific facilities. These efforts are focused on providing users with the full potential offered by real-time, remote and self-driving experiments, where AI-driven analysis can guide experimental decisions in real time, while ensuring that the data pipelines adhere to the findability, accessibility, interoperability and reuse principles throughout their entire facility lifecycle. Besides all the efforts being made, a user-centric and user-friendly centralization of the overall scientific computing framework at the large scientific facilities remains a work in progress. To address this challenge the Big Data Science Center at the Shanghai Synchrotron Radiation Facility has developed and deployed a centralized, cohesive and user-friendly platform on top of its already existing superfacility framework, which is designed to manage the complete data lifecycle at large scientific facilities. This user-centric platform has transformed the user experience, shifting focus from complex data operations to scientific interpretation. Consequently, the accessibility of the facility to users has been considerably enhanced, thereby expediting the pace at which their discoveries are made.

Establishing stable active sites and molecular-scale bridging architectures at electrode-electrolyte interfaces is essential for advancing fast-charging batteries, yet remains challenging because the principles governing interfacial reaction networks and materials design are not fully understood. In sulfur-based electrodes, irreversible sulfur-cluster dissolution and progressive interfacial degradation severely limit capacity retention and cycling stability. Here we show that reversible dynamic covalent tethering can be constructed at electrified interfaces by coupling hierarchically structured FeS₂ with exogenous sulfur clusters. During the initial full discharge, Cu²⁺ ions are spontaneously reduced and reconstruct the interface to form a Cu₂S/FeS₂ heterostructure, in which interfacial Fe-S-Cu bonds act as ordered covalent bridges. This surface-bound Fe-S-Cu bridging topology reduces interfacial resistance, accelerates charge-transfer kinetics and suppresses metastable phase formation arising from incomplete conversion. Copper ions further function as molecular rivets, preferentially depositing at edge sites and directionally bonding with sulfur atoms to stabilize the FeS₂-hosted sulfur redox system. This dynamic bonding framework preserves the structural coherence of the FeS₂ matrix while immobilizing polysulfide intermediates, enabling more than 68,000 charge-discharge cycles at 100 A g^-1. Our findings establish a molecular-level design strategy that links atomic bonding motifs with macroscopic electrochemical functionality.

Metal halide perovskite light-emitting diodes (PeLEDs) have demonstrated excellent external quantum efficiency (EQE), easy colour tunability and low-cost processability, making them promising next-generation display techniques^1,2,3. However, PeLEDs still underperform compared with organic light-emitting diodes (LEDs) with an EQE of about 40% because of insufficient charge confinement and defect-caused non-radiative recombination on the film surface. Here we report a spontaneously formed 3D/2D vertically oriented perovskite heterojunction by means of a simple one-step spin-coating method, which could effectively confine the charge carriers and shift the radiation zone away from the defect-rich surface region. Notably, the 2D perovskite on top exhibits a wrinkled surface morphology, which offers up to 45.4% light extraction efficiency. The resulting PeLEDs achieved an EQE of 42.9% for the green emission (certified 42.3%). Our work sheds light on the strategies for fabricating high-efficiency PeLEDs in the future.

The EUV light emitted by the synchrotron radiation source exhibits a stable wavelength and pollution-free characteristics, making it highly suitable for technical verification in diverse EUV lithography applications and playing a pivotal role in EUV lithography industry research. To guide the EUV light from the beamline into the experimental platform, this paper proposes a deflection system design based on the Shanghai Synchrotron Radiation Facility (SSRF). This system enables beamline diagnostics for EUV light while facilitating precise positioning and performance testing of the Mo/Si multilayer planar deflection mirror. The deflection system achieves accurate installation and alignment through a coordinate transfer protocol. By imaging the EUV incident light spot on a scintillator and analyzing variations in EUV light intensity data before and after the deflection mirror, the system can accurately measure focused light spot parameters from the beamline and achieve submicron alignment accuracy with 10 μrad angular resolution for the deflection mirror. The proposed design provides valuable insights for advancing EUV lithography technology utilizing synchrotron radiation sources.