Duc-Nam Nguyen
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Research Subjects
Research Interests
Duc-Nam Nguyen has a total of 5 co-authors. Here are the top co-authors by number of shared publications:
- Baochun Tao
Special Equipment Institute, Hangzhou Vocational & Technical College, Hangzhou 310018, China
1 shared publication - Binghai Lyu
Ultra‐precision Machining Research Center Zhejiang University of Technology Hangzhou 310014 Zhejiang China
1 shared publication - Chengqi Zhang
Ultra-Precision Machining Center, Zhejiang University of Technology, Hangzhou 310023, China
1 shared publication - Hong Zhang
Ultra-Precision Machining Center, Zhejiang University of Technology, Hangzhou 310023, China
1 shared publication - Qianfa Deng
Ultra-Precision Machining Center, Zhejiang University of Technology, Hangzhou 310023, China
1 shared publication
Latest Publications
- Open Access
- 14 April 2023
- Published by MDPI AG in Micromachines
- Vol. 14 (4) , 852
Research on Abrasive Water Jet Polishing of Silicon Carbide Based on Fluid Self-Excited Oscillation Pulse Characteristics
A self-excited oscillating pulsed abrasive water jet polishing method is proposed to solve the problems of low removal efficiency in traditional abrasive water jet polishing and the influence of an external flow field on the material surface removal rate. The self-excited oscillating chamber of the nozzle was used to generate pulsed water jets to reduce the impact of the jet stagnation zone on material surface removal and increase the jet speed to improve processing efficiency. ANSYS Fluent was employed to simulate the processing flow field characteristics for different lengths of oscillation cavities. The simulation results indicate that the velocity of the jet shaft reached a maximum of 178.26 m/s when the length of the oscillation cavity was 4 mm. The erosion rate of the material is linear with the processing angle. A nozzle with a length of 4 mm of the self-excited oscillating cavity was fabricated for SiC surface polishing experiments. The results were compared with those of ordinary abrasive water jet polishing. The experimental results showed that the self-excited oscillation pulse fluid enhanced the erosion ability of the abrasive water jet on the SiC surface and significantly improved the material-removal depth of the abrasive water jet polishing SiC. The maximum surface erosion depth can be increased by 26 μm.
- 14 April 2023
- Published by MDPI AG in Micromachines
- Vol. 14 (4) , 852
Open AccessResearch on Abrasive Water Jet Polishing of Silicon Carbide Based on Fluid Self-Excited Oscillation Pulse Characteristics
A self-excited oscillating pulsed abrasive water jet polishing method is proposed to solve the problems of low removal efficiency in traditional abrasive water jet polishing and the influence of an external flow field on the material surface removal rate. The self-excited oscillating chamber of the nozzle was used to generate pulsed water jets to reduce the impact of the jet stagnation zone on material surface removal and increase the jet speed to improve processing efficiency. ANSYS Fluent was employed to simulate the processing flow field characteristics for different lengths of oscillation cavities. The simulation results indicate that the velocity of the jet shaft reached a maximum of 178.26 m/s when the length of the oscillation cavity was 4 mm. The erosion rate of the material is linear with the processing angle. A nozzle with a length of 4 mm of the self-excited oscillating cavity was fabricated for SiC surface polishing experiments. The results were compared with those of ordinary abrasive water jet polishing. The experimental results showed that the self-excited oscillation pulse fluid enhanced the erosion ability of the abrasive water jet on the SiC surface and significantly improved the material-removal depth of the abrasive water jet polishing SiC. The maximum surface erosion depth can be increased by 26 μm.