Rommel Jones
Rommel Jones has a total of 6 co-authors. Here are the top co-authors by number of shared publications:
- Daniel Jorge Rodriguez
Materials Science and Technology Division, Los Alamos National Laboratory, Los Alamos, Los Alamos, 87545, UNITED STATES
1 shared publication - Douglas J. Safarik
Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
1 shared publication - Igor Olegovich Usov
Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
1 shared publication - Mai Ar Her
Finishing Manufacturing Science (Sigma-2), Los Alamos National Laboratory 2 , P.O. Box 1663, Los Alamos, New Mexico 87545
1 shared publication - Michael G. Heidlage
Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
1 shared publication - Timothy John Gorey
Los Alamos National Laboratory
1 shared publication
Latest Publications
- Open Access
- 1 November 2024
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 95 (11)
An automatic multi-precursor flow-type atomic layer deposition system
Designs for two automated atomic layer deposition (ALD) flow reactors are presented, and their capabilities for coating additively manufactured (AM) metal prints are described. One instrument allows the coating of several AM parts in batches, while the other is useful for single part experiments. To demonstrate reactor capabilities, alumina (Al2O3) was deposited onto AM 316L stainless steel by dosing with water (H2O) vapor and trimethylaluminum (TMA) and purging with nitrogen gas (N2). Both instruments are controlled by custom-programmed LabVIEW software that enables in situ logging of temperature, total pressure, and film thickness using a quartz crystal microbalance. An initial result shows that 150 ALD cycles led to a film thickness of ∼55 nm, which was verified with Rutherford backscattering spectroscopy. This indicates that the reactors were indeed depositing single atomic layers of Al2O3 per ALD cycle, as intended.
- 1 November 2024
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 95 (11)
Open AccessAn automatic multi-precursor flow-type atomic layer deposition system
Designs for two automated atomic layer deposition (ALD) flow reactors are presented, and their capabilities for coating additively manufactured (AM) metal prints are described. One instrument allows the coating of several AM parts in batches, while the other is useful for single part experiments. To demonstrate reactor capabilities, alumina (Al2O3) was deposited onto AM 316L stainless steel by dosing with water (H2O) vapor and trimethylaluminum (TMA) and purging with nitrogen gas (N2). Both instruments are controlled by custom-programmed LabVIEW software that enables in situ logging of temperature, total pressure, and film thickness using a quartz crystal microbalance. An initial result shows that 150 ALD cycles led to a film thickness of ∼55 nm, which was verified with Rutherford backscattering spectroscopy. This indicates that the reactors were indeed depositing single atomic layers of Al2O3 per ALD cycle, as intended.