Bohan Shi
Current Organizations / Institutes
The organizations/institutes from the scholar's latest article
Bohan Shi has a total of 11 co-authors. Here are the top co-authors by number of shared publications:
- Linyuan Zhang
School of Microelectronics, Northwestern Polytechnical University, Xi’an 710072, China
2 shared publications - Wei Liu
School of Microelectronics, Northwestern Polytechnical University, Xi’an 710072, China
2 shared publications - Xinnan Zhao
School of Microelectronics, Northwestern Polytechnical University, Xi’an 710072, China
2 shared publications - Zeyu Liu
School of Microelectronics, Northwestern Polytechnical University, Xi’an 710072, China
2 shared publications - Chengrui Yan
School of Microelectronics, Northwestern Polytechnical University, Xi’an 710072, China
1 shared publication - Di Wang
School of Microelectronics, Northwestern Polytechnical University, Xi’an 710072, China
1 shared publication
Latest Publications
- Open Access
- 21 July 2025
- Published by MDPI AG in Micromachines
- Vol. 16 (7) , 833
Investigation on the Carrier Dynamics in P-I-N Type Photovoltaic Devices with Different Step-Gradient Distribution of Indium Content in the Intrinsic Region
InGaN-based photovoltaic devices have attracted great attention due to their remarkable theoretical potential for high efficiency. In this paper, the influence of different distributions of step-gradient indium content within the intrinsic region on the photovoltaic performance of P-I-N type InGaN/GaN solar cells is numerically investigated. Through the comprehensive analysis of carrier dynamics, it is found that for the device with the indium content decreasing stepwise from 50% at the top to 10% at the bottom in intrinsic region, the photovoltaic conversion efficiency is increased to 10.29%, which can be attributed to joint influence of enhanced photon absorption, reduced recombination rate, and optimized carrier transport process.
- 21 July 2025
- Published by MDPI AG in Micromachines
- Vol. 16 (7) , 833
Open AccessInvestigation on the Carrier Dynamics in P-I-N Type Photovoltaic Devices with Different Step-Gradient Distribution of Indium Content in the Intrinsic Region
InGaN-based photovoltaic devices have attracted great attention due to their remarkable theoretical potential for high efficiency. In this paper, the influence of different distributions of step-gradient indium content within the intrinsic region on the photovoltaic performance of P-I-N type InGaN/GaN solar cells is numerically investigated. Through the comprehensive analysis of carrier dynamics, it is found that for the device with the indium content decreasing stepwise from 50% at the top to 10% at the bottom in intrinsic region, the photovoltaic conversion efficiency is increased to 10.29%, which can be attributed to joint influence of enhanced photon absorption, reduced recombination rate, and optimized carrier transport process.
- Open Access
- 16 December 2024
- Published by MDPI AG in Micromachines
- Vol. 15 (12) , 1502
Study on the Carrier Transport Process in Deep Ultraviolet Light-Emitting Diodes with Al-Content-Varied AlGaN Composite Last Quantum Barrier
Serious electron leakage and poor hole injection efficiency are still challenges for deep ultraviolet AlGaN-based light-emitting diodes with a traditional structure in achieving high performance. Currently, the majority of research works concentrate on optimizing the structures of the electron blocking layer (EBL) and last quantum barrier (LQB) separately, rather than considering them as an integrated structure. Therefore, in this study, an Al-content-varied AlGaN composite last quantum barrier (CLQB) layer is proposed to replace the traditional EBL and LQB layers. It is found that when the Al content in the CLQB decreases from 70% to 60% along the growth direction, the sample’s luminescence efficiency is improved, which can be ascribed to the higher carrier concentration in the multiple quantum well active region caused by suppressed electron leakage and enhanced hole injection. Additionally, in the CLQB structure, the carrier loss at the EBL/LQB hetero-interface, which is inevitable in the traditional structure, can be avoided. However, if the Al content in the CLQB changes in an opposite way, i.e., increasing from 60% to 70%, the device optoelectronic performance deteriorates, since the electron leakage is enhanced and the hole injection is suppressed.
- 16 December 2024
- Published by MDPI AG in Micromachines
- Vol. 15 (12) , 1502
Open AccessStudy on the Carrier Transport Process in Deep Ultraviolet Light-Emitting Diodes with Al-Content-Varied AlGaN Composite Last Quantum Barrier
Serious electron leakage and poor hole injection efficiency are still challenges for deep ultraviolet AlGaN-based light-emitting diodes with a traditional structure in achieving high performance. Currently, the majority of research works concentrate on optimizing the structures of the electron blocking layer (EBL) and last quantum barrier (LQB) separately, rather than considering them as an integrated structure. Therefore, in this study, an Al-content-varied AlGaN composite last quantum barrier (CLQB) layer is proposed to replace the traditional EBL and LQB layers. It is found that when the Al content in the CLQB decreases from 70% to 60% along the growth direction, the sample’s luminescence efficiency is improved, which can be ascribed to the higher carrier concentration in the multiple quantum well active region caused by suppressed electron leakage and enhanced hole injection. Additionally, in the CLQB structure, the carrier loss at the EBL/LQB hetero-interface, which is inevitable in the traditional structure, can be avoided. However, if the Al content in the CLQB changes in an opposite way, i.e., increasing from 60% to 70%, the device optoelectronic performance deteriorates, since the electron leakage is enhanced and the hole injection is suppressed.