Polycrystalline silicon thin films grown by dc arc discharge ion plating
Authors:
- Makoto YoshidaMYMakoto Yoshida
- Takahiro SaidaTSTakahiro Saida
- Satoshi OkadaSOSatoshi Okada
- Masahiro AkamatsuMAMasahiro Akamatsu
- Kenichi KondoKKKenichi Kondo
- 1 November 1998
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 335 (1-2) , 127-129
Abstract
No abstract availableKeywords
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