Abstract
Experimental data and a model are presented which define the boundary values of V/III flux ratio and growth temperature for droplet-assisted nucleation of InAs semiconductor nanowires in selective-area epitaxy on SiO x /Si (111) substrates by molecular beam epitaxy. Within these boundaries, the substrate receives a balanced flux of group III and V materials allowing the growth of vertically oriented nanowires as compared to the formation of droplets or crystallites.
Funding Information
  • Natural Sciences and Engineering Research Council of Canada (RGPIN/311939-2013)
  • Russian Foundation for Basic Research (13-02-12045, 15-52-78057 and 15-52-53041)

This publication has 36 references indexed in Scilit: