Comprehensive Investigation of Constant Voltage Stress Time-Dependent Breakdown and Cycle-to-Breakdown Reliability in Y-Doped and Si-Doped HfO2 Metal-Ferroelectric-Metal Memory
Open Access
- 19 July 2023
- journal article
- research article
- Published by MDPI AG in Nanomaterials
- Vol. 13 (14) , 2104
Abstract
In this study, we comprehensively investigate the constant voltage stress (CVS) time-dependent breakdown and cycle-to-breakdown while considering metal-ferroelectric-metal (MFM) memory, which has distinct domain sizes induced by different doping species, i.e., Yttrium (Y) (Sample A) and Silicon (Si) (Sample B). Firstly, Y-doped and Si-doped HfO2 MFM devices exhibit domain sizes of 5.64 nm and 12.47 nm, respectively. Secondly, Si-doped HfO2 MFM devices (Sample B) have better CVS time-dependent breakdown and cycle-to-breakdown stability than Y-doped HfO2 MFM devices (Sample A). Therefore, a larger domain size showing higher extrapolated voltage under CVS time-dependent breakdown and cycle-to-breakdown evaluations was observed, indicating that the domain size crucially impacts the stability of MFM memory.Keywords
Funding Information
- Advanced Semiconductor Technology Research Center (111-2634-F-A49-008, 111-2622-8-A49-018-SB, 112-2636-E-A49-005)
- Ministry of Science and Technology, Taiwan (111-2634-F-A49-008, 111-2622-8-A49-018-SB, 112-2636-E-A49-005)
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